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Application of Silicon Nanostructure Arrays for 6-inch Mono and Multi-Crystalline Solar Cell

In this study, we fabricate uniform silicon nanowire (SiNW) arrays on 6-inch mono- and multi-crystalline wafers by employing the improved solution-processed metal-assisted chemical etching (MacEtch) method. Furthermore, the improved MacEtch can be applied to various crystalline orientation wafers. T...

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Detalles Bibliográficos
Autores principales: Hsueh, Chen-Chih, Thiyagu, Subramani, Liu, Chien-Ting, Syu, Hong-Jhang, Yang, Song-Ting, Lin, Ching-Fuh
Formato: Online Artículo Texto
Lenguaje:English
Publicado: Springer US 2019
Materias:
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC6588671/
https://www.ncbi.nlm.nih.gov/pubmed/31227947
http://dx.doi.org/10.1186/s11671-019-3030-y
Descripción
Sumario:In this study, we fabricate uniform silicon nanowire (SiNW) arrays on 6-inch mono- and multi-crystalline wafers by employing the improved solution-processed metal-assisted chemical etching (MacEtch) method. Furthermore, the improved MacEtch can be applied to various crystalline orientation wafers. The SiNW arrays are 470 nm in length with high density; they demonstrate a good optical trapping effect and reflectance well below 6% over a broad wavelength range from 300 to 1100 nm. The improved MacEtch shows no difference in reflectance for a pyramid/SiNW mono-crystalline wafer with appropriate uniformity; the average delta from the center to other positions is within 22%. The effective lifetime is lower for SiNW arrays because the higher surface state causes higher surface recombination. Finally, we make the multi-crystalline wafer into an Al-BSF solar cell device with MacEtch SiNW texture, resulting in an averaged power conversion efficiency of 17.83%, which is higher than that of standard acid-textured solar cell devices. Consequently, the improved MacEtch concept is suitable for commercial mass production in the photovoltaic industry.