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Postdeposition UV-Ozone Treatment: An Enabling Technique to Enhance the Direct Adhesion of Gold Thin Films to Oxidized Silicon
[Image: see text] We found that continuous films of gold (Au) on oxidized silicon (SiO(2)) substrates, upon treatment with ultraviolet (UV)-ozone, exhibit strong adhesion to the SiO(2) support. Importantly, the enhancement is independent of micro- or nanostructuring of such nanometer-thick films. De...
Autores principales: | , , , , , |
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Formato: | Online Artículo Texto |
Lenguaje: | English |
Publicado: |
American
Chemical Society
2019
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Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC6595434/ https://www.ncbi.nlm.nih.gov/pubmed/31189059 http://dx.doi.org/10.1021/acsnano.9b01403 |
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author | Le-The, Hai Tiggelaar, Roald M. Berenschot, Erwin van den Berg, Albert Tas, Niels Eijkel, Jan C. T. |
author_facet | Le-The, Hai Tiggelaar, Roald M. Berenschot, Erwin van den Berg, Albert Tas, Niels Eijkel, Jan C. T. |
author_sort | Le-The, Hai |
collection | PubMed |
description | [Image: see text] We found that continuous films of gold (Au) on oxidized silicon (SiO(2)) substrates, upon treatment with ultraviolet (UV)-ozone, exhibit strong adhesion to the SiO(2) support. Importantly, the enhancement is independent of micro- or nanostructuring of such nanometer-thick films. Deposition of a second Au layer on top of the pretreated Au layer makes the adhesion stable for at least 5 months in environmental air. Using this treatment method enables us to large-scale fabricate various SiO(2)-supported Au structures at various thicknesses with dimensions spanning from a few hundreds of nanometers to a few micrometers, without the use of additional adhesion layers. We explain the observed adhesion improvement as polarization-induced increased strength of Au(δ−)Si(δ+) bonds at the Au–SiO(2) interface due to the formation of a gold oxide monolayer on the Au surface by the UV-ozone treatment. Our simple and enabling method thus provides opportunities for patterning Au micro/nanostructures on SiO(2) substrates without an intermediate metallic adhesion layer, which is critical for biosensing and nanophotonic applications. |
format | Online Article Text |
id | pubmed-6595434 |
institution | National Center for Biotechnology Information |
language | English |
publishDate | 2019 |
publisher | American
Chemical Society |
record_format | MEDLINE/PubMed |
spelling | pubmed-65954342019-07-01 Postdeposition UV-Ozone Treatment: An Enabling Technique to Enhance the Direct Adhesion of Gold Thin Films to Oxidized Silicon Le-The, Hai Tiggelaar, Roald M. Berenschot, Erwin van den Berg, Albert Tas, Niels Eijkel, Jan C. T. ACS Nano [Image: see text] We found that continuous films of gold (Au) on oxidized silicon (SiO(2)) substrates, upon treatment with ultraviolet (UV)-ozone, exhibit strong adhesion to the SiO(2) support. Importantly, the enhancement is independent of micro- or nanostructuring of such nanometer-thick films. Deposition of a second Au layer on top of the pretreated Au layer makes the adhesion stable for at least 5 months in environmental air. Using this treatment method enables us to large-scale fabricate various SiO(2)-supported Au structures at various thicknesses with dimensions spanning from a few hundreds of nanometers to a few micrometers, without the use of additional adhesion layers. We explain the observed adhesion improvement as polarization-induced increased strength of Au(δ−)Si(δ+) bonds at the Au–SiO(2) interface due to the formation of a gold oxide monolayer on the Au surface by the UV-ozone treatment. Our simple and enabling method thus provides opportunities for patterning Au micro/nanostructures on SiO(2) substrates without an intermediate metallic adhesion layer, which is critical for biosensing and nanophotonic applications. American Chemical Society 2019-06-12 2019-06-25 /pmc/articles/PMC6595434/ /pubmed/31189059 http://dx.doi.org/10.1021/acsnano.9b01403 Text en Copyright © 2019 American Chemical Society This is an open access article published under a Creative Commons Non-Commercial No Derivative Works (CC-BY-NC-ND) Attribution License (http://pubs.acs.org/page/policy/authorchoice_ccbyncnd_termsofuse.html) , which permits copying and redistribution of the article, and creation of adaptations, all for non-commercial purposes. |
spellingShingle | Le-The, Hai Tiggelaar, Roald M. Berenschot, Erwin van den Berg, Albert Tas, Niels Eijkel, Jan C. T. Postdeposition UV-Ozone Treatment: An Enabling Technique to Enhance the Direct Adhesion of Gold Thin Films to Oxidized Silicon |
title | Postdeposition
UV-Ozone Treatment: An Enabling Technique
to Enhance the Direct Adhesion of Gold Thin Films to Oxidized Silicon |
title_full | Postdeposition
UV-Ozone Treatment: An Enabling Technique
to Enhance the Direct Adhesion of Gold Thin Films to Oxidized Silicon |
title_fullStr | Postdeposition
UV-Ozone Treatment: An Enabling Technique
to Enhance the Direct Adhesion of Gold Thin Films to Oxidized Silicon |
title_full_unstemmed | Postdeposition
UV-Ozone Treatment: An Enabling Technique
to Enhance the Direct Adhesion of Gold Thin Films to Oxidized Silicon |
title_short | Postdeposition
UV-Ozone Treatment: An Enabling Technique
to Enhance the Direct Adhesion of Gold Thin Films to Oxidized Silicon |
title_sort | postdeposition
uv-ozone treatment: an enabling technique
to enhance the direct adhesion of gold thin films to oxidized silicon |
url | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC6595434/ https://www.ncbi.nlm.nih.gov/pubmed/31189059 http://dx.doi.org/10.1021/acsnano.9b01403 |
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