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Bipolar Cu/HfO(2)/p(++) Si Memristors by Sol-Gel Spin Coating Method and Their Application to Environmental Sensing

In this paper, the memristive switching behavior of Cu/ HfO(2)/p(++) Si devices fabricated by an organic-polymer-assisted sol-gel spin-coating method, coupled with post-annealing and shadow-mask metal sputtering steps, is examined. HfO(2) layers of about 190 nm and 80 nm, are established using cost-...

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Autores principales: Abdul Hadi, Sabina, Humood, Khaled M., Abi Jaoude, Maguy, Abunahla, Heba, Shehhi, Hamda Faisal Al, Mohammad, Baker
Formato: Online Artículo Texto
Lenguaje:English
Publicado: Nature Publishing Group UK 2019
Materias:
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC6620357/
https://www.ncbi.nlm.nih.gov/pubmed/31292515
http://dx.doi.org/10.1038/s41598-019-46443-x
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author Abdul Hadi, Sabina
Humood, Khaled M.
Abi Jaoude, Maguy
Abunahla, Heba
Shehhi, Hamda Faisal Al
Mohammad, Baker
author_facet Abdul Hadi, Sabina
Humood, Khaled M.
Abi Jaoude, Maguy
Abunahla, Heba
Shehhi, Hamda Faisal Al
Mohammad, Baker
author_sort Abdul Hadi, Sabina
collection PubMed
description In this paper, the memristive switching behavior of Cu/ HfO(2)/p(++) Si devices fabricated by an organic-polymer-assisted sol-gel spin-coating method, coupled with post-annealing and shadow-mask metal sputtering steps, is examined. HfO(2) layers of about 190 nm and 80 nm, are established using cost-effective spin-coating method, at deposition speeds of 2000 and 4000 rotations per minute (RPM), respectively. For two types of devices, the memristive characteristics (V(on), I(on), and V(reset)) and device-to-device electrical repeatability are primarily discussed in correlation with the oxide layer uniformity and thickness. The devices presented in this work exhibit an electroforming free and bipolar memory-resistive switching behavior that is typical of an Electrochemical Metallization (ECM) I-V fingerprint. The sample devices deposited at 4000 RPM generally show less variation in electrical performance parameters compared to those prepared at halved spin-coating speed. Typically, the samples prepared at 4000 RPM (n = 8) display a mean switching voltage V(on) of 3.0 V (±0.3) and mean reset voltage V(reset) of −1.1 V (±0.5) over 50 consecutive sweep cycles. These devices exhibit a large R(off)/R(on) window (up to 10(4)), and sufficient electrical endurance and retention properties to be further examined for radiation sensing. As they exhibit less statistical uncertainty compared to the samples fabricated at 2000 RPM, the devices prepared at 4000 RPM are tested for the detection of soft gamma rays (emitted from low-activity Cs-137 and Am-241 radioactive sources), by assessing the variation in the on-state resistance value upon exposure. The analysis of the probability distributions of the logarithmic R(on) values measured over repeated ON-OFF cycles, before, during and after exposing the devices to radiation, demonstrate a statistical difference. These results pave the way for the fabrication and development of cost-effective soft-gamma ray detectors.
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spelling pubmed-66203572019-07-18 Bipolar Cu/HfO(2)/p(++) Si Memristors by Sol-Gel Spin Coating Method and Their Application to Environmental Sensing Abdul Hadi, Sabina Humood, Khaled M. Abi Jaoude, Maguy Abunahla, Heba Shehhi, Hamda Faisal Al Mohammad, Baker Sci Rep Article In this paper, the memristive switching behavior of Cu/ HfO(2)/p(++) Si devices fabricated by an organic-polymer-assisted sol-gel spin-coating method, coupled with post-annealing and shadow-mask metal sputtering steps, is examined. HfO(2) layers of about 190 nm and 80 nm, are established using cost-effective spin-coating method, at deposition speeds of 2000 and 4000 rotations per minute (RPM), respectively. For two types of devices, the memristive characteristics (V(on), I(on), and V(reset)) and device-to-device electrical repeatability are primarily discussed in correlation with the oxide layer uniformity and thickness. The devices presented in this work exhibit an electroforming free and bipolar memory-resistive switching behavior that is typical of an Electrochemical Metallization (ECM) I-V fingerprint. The sample devices deposited at 4000 RPM generally show less variation in electrical performance parameters compared to those prepared at halved spin-coating speed. Typically, the samples prepared at 4000 RPM (n = 8) display a mean switching voltage V(on) of 3.0 V (±0.3) and mean reset voltage V(reset) of −1.1 V (±0.5) over 50 consecutive sweep cycles. These devices exhibit a large R(off)/R(on) window (up to 10(4)), and sufficient electrical endurance and retention properties to be further examined for radiation sensing. As they exhibit less statistical uncertainty compared to the samples fabricated at 2000 RPM, the devices prepared at 4000 RPM are tested for the detection of soft gamma rays (emitted from low-activity Cs-137 and Am-241 radioactive sources), by assessing the variation in the on-state resistance value upon exposure. The analysis of the probability distributions of the logarithmic R(on) values measured over repeated ON-OFF cycles, before, during and after exposing the devices to radiation, demonstrate a statistical difference. These results pave the way for the fabrication and development of cost-effective soft-gamma ray detectors. Nature Publishing Group UK 2019-07-10 /pmc/articles/PMC6620357/ /pubmed/31292515 http://dx.doi.org/10.1038/s41598-019-46443-x Text en © The Author(s) 2019 Open Access This article is licensed under a Creative Commons Attribution 4.0 International License, which permits use, sharing, adaptation, distribution and reproduction in any medium or format, as long as you give appropriate credit to the original author(s) and the source, provide a link to the Creative Commons license, and indicate if changes were made. The images or other third party material in this article are included in the article’s Creative Commons license, unless indicated otherwise in a credit line to the material. If material is not included in the article’s Creative Commons license and your intended use is not permitted by statutory regulation or exceeds the permitted use, you will need to obtain permission directly from the copyright holder. To view a copy of this license, visit http://creativecommons.org/licenses/by/4.0/.
spellingShingle Article
Abdul Hadi, Sabina
Humood, Khaled M.
Abi Jaoude, Maguy
Abunahla, Heba
Shehhi, Hamda Faisal Al
Mohammad, Baker
Bipolar Cu/HfO(2)/p(++) Si Memristors by Sol-Gel Spin Coating Method and Their Application to Environmental Sensing
title Bipolar Cu/HfO(2)/p(++) Si Memristors by Sol-Gel Spin Coating Method and Their Application to Environmental Sensing
title_full Bipolar Cu/HfO(2)/p(++) Si Memristors by Sol-Gel Spin Coating Method and Their Application to Environmental Sensing
title_fullStr Bipolar Cu/HfO(2)/p(++) Si Memristors by Sol-Gel Spin Coating Method and Their Application to Environmental Sensing
title_full_unstemmed Bipolar Cu/HfO(2)/p(++) Si Memristors by Sol-Gel Spin Coating Method and Their Application to Environmental Sensing
title_short Bipolar Cu/HfO(2)/p(++) Si Memristors by Sol-Gel Spin Coating Method and Their Application to Environmental Sensing
title_sort bipolar cu/hfo(2)/p(++) si memristors by sol-gel spin coating method and their application to environmental sensing
topic Article
url https://www.ncbi.nlm.nih.gov/pmc/articles/PMC6620357/
https://www.ncbi.nlm.nih.gov/pubmed/31292515
http://dx.doi.org/10.1038/s41598-019-46443-x
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