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A Highly Robust Silicon Ultraviolet Selective Radiation Sensor Using Differential Spectral Response Method †
This paper presents a silicon ultraviolet radiation sensor with over 90% UV internal quantum efficiency (QE) and high selectivity to the UV waveband without using optical filters. The sensor was developed for applications that require UV measurement under strong background visible and near-infrared...
Autores principales: | , , |
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Formato: | Online Artículo Texto |
Lenguaje: | English |
Publicado: |
MDPI
2019
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Materias: | |
Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC6631557/ https://www.ncbi.nlm.nih.gov/pubmed/31248157 http://dx.doi.org/10.3390/s19122755 |
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author | Sipauba Carvalho da Silva, Yhang Ricardo Kuroda, Rihito Sugawa, Shigetoshi |
author_facet | Sipauba Carvalho da Silva, Yhang Ricardo Kuroda, Rihito Sugawa, Shigetoshi |
author_sort | Sipauba Carvalho da Silva, Yhang Ricardo |
collection | PubMed |
description | This paper presents a silicon ultraviolet radiation sensor with over 90% UV internal quantum efficiency (QE) and high selectivity to the UV waveband without using optical filters. The sensor was developed for applications that require UV measurement under strong background visible and near-infrared (NIR) lights, such as solar UV measurement, UV-C monitoring in greenhouses or automated factories, and so on. The developed sensor is composed of monolithically formed silicon photodiodes with different spectral sensitivities: a highly UV responsive photodiode with internal quantum efficiency (QE) of nearly 100% for UV light, and a lowly UV responsive photodiode with UV internal QE lower than 10%. The photodiodes were optimized to match their visible and NIR light responsivity, and the UV signal is extracted from the background radiation by using the differential spectral response method. With this approach, an internal QE of over 90% for UV light was obtained, with a residual internal QE to non-UV light lower than 20% for 400 nm, 5% for 500 nm, 2% for 600 nm and 0.6% to NIR light. The developed sensor showed no responsivity degradation after exposure towards strong UV light. It was confirmed by the simulation results that the residual responsivity is further suppressed by employing an on-chip band-rejection optical layer consisting of several layers of silicon oxide and silicon nitride films. |
format | Online Article Text |
id | pubmed-6631557 |
institution | National Center for Biotechnology Information |
language | English |
publishDate | 2019 |
publisher | MDPI |
record_format | MEDLINE/PubMed |
spelling | pubmed-66315572019-08-19 A Highly Robust Silicon Ultraviolet Selective Radiation Sensor Using Differential Spectral Response Method † Sipauba Carvalho da Silva, Yhang Ricardo Kuroda, Rihito Sugawa, Shigetoshi Sensors (Basel) Article This paper presents a silicon ultraviolet radiation sensor with over 90% UV internal quantum efficiency (QE) and high selectivity to the UV waveband without using optical filters. The sensor was developed for applications that require UV measurement under strong background visible and near-infrared (NIR) lights, such as solar UV measurement, UV-C monitoring in greenhouses or automated factories, and so on. The developed sensor is composed of monolithically formed silicon photodiodes with different spectral sensitivities: a highly UV responsive photodiode with internal quantum efficiency (QE) of nearly 100% for UV light, and a lowly UV responsive photodiode with UV internal QE lower than 10%. The photodiodes were optimized to match their visible and NIR light responsivity, and the UV signal is extracted from the background radiation by using the differential spectral response method. With this approach, an internal QE of over 90% for UV light was obtained, with a residual internal QE to non-UV light lower than 20% for 400 nm, 5% for 500 nm, 2% for 600 nm and 0.6% to NIR light. The developed sensor showed no responsivity degradation after exposure towards strong UV light. It was confirmed by the simulation results that the residual responsivity is further suppressed by employing an on-chip band-rejection optical layer consisting of several layers of silicon oxide and silicon nitride films. MDPI 2019-06-19 /pmc/articles/PMC6631557/ /pubmed/31248157 http://dx.doi.org/10.3390/s19122755 Text en © 2019 by the authors. Licensee MDPI, Basel, Switzerland. This article is an open access article distributed under the terms and conditions of the Creative Commons Attribution (CC BY) license (http://creativecommons.org/licenses/by/4.0/). |
spellingShingle | Article Sipauba Carvalho da Silva, Yhang Ricardo Kuroda, Rihito Sugawa, Shigetoshi A Highly Robust Silicon Ultraviolet Selective Radiation Sensor Using Differential Spectral Response Method † |
title | A Highly Robust Silicon Ultraviolet Selective Radiation Sensor Using Differential Spectral Response Method † |
title_full | A Highly Robust Silicon Ultraviolet Selective Radiation Sensor Using Differential Spectral Response Method † |
title_fullStr | A Highly Robust Silicon Ultraviolet Selective Radiation Sensor Using Differential Spectral Response Method † |
title_full_unstemmed | A Highly Robust Silicon Ultraviolet Selective Radiation Sensor Using Differential Spectral Response Method † |
title_short | A Highly Robust Silicon Ultraviolet Selective Radiation Sensor Using Differential Spectral Response Method † |
title_sort | highly robust silicon ultraviolet selective radiation sensor using differential spectral response method † |
topic | Article |
url | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC6631557/ https://www.ncbi.nlm.nih.gov/pubmed/31248157 http://dx.doi.org/10.3390/s19122755 |
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