Comparison of chemical stability and corrosion resistance of group IV metal oxide films formed by thermal and plasma-enhanced atomic layer deposition

The wide applications of ultrathin group IV metal oxide films (TiO(2), ZrO(2) and HfO(2)) probably expose materials to potentially reactive etchants and solvents, appealing for extraordinary chemical stability and corrosion resistance property. In this paper, TiO(2) ultrathin films were deposited on...

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Detalles Bibliográficos
Autores principales: Li, Min, Jin, Zhi-Xian, Zhang, Wei, Bai, Yu-Hang, Cao, Yan-Qiang, Li, Wei-Ming, Wu, Di, Li, Ai-Dong
Formato: Online Artículo Texto
Lenguaje:English
Publicado: Nature Publishing Group UK 2019
Materias:
Article
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC6639315/
https://www.ncbi.nlm.nih.gov/pubmed/31320728
http://dx.doi.org/10.1038/s41598-019-47049-z

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC6639315/
https://www.ncbi.nlm.nih.gov/pubmed/31320728
http://dx.doi.org/10.1038/s41598-019-47049-z

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