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Comparison of chemical stability and corrosion resistance of group IV metal oxide films formed by thermal and plasma-enhanced atomic layer deposition
The wide applications of ultrathin group IV metal oxide films (TiO(2), ZrO(2) and HfO(2)) probably expose materials to potentially reactive etchants and solvents, appealing for extraordinary chemical stability and corrosion resistance property. In this paper, TiO(2) ultrathin films were deposited on...
Autores principales: | Li, Min, Jin, Zhi-Xian, Zhang, Wei, Bai, Yu-Hang, Cao, Yan-Qiang, Li, Wei-Ming, Wu, Di, Li, Ai-Dong |
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Formato: | Online Artículo Texto |
Lenguaje: | English |
Publicado: |
Nature Publishing Group UK
2019
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Materias: | |
Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC6639315/ https://www.ncbi.nlm.nih.gov/pubmed/31320728 http://dx.doi.org/10.1038/s41598-019-47049-z |
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