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Probing Crystal Dislocations in a Micrometer-Thick GaN Film by Modern High-Voltage Electron Microscopy

[Image: see text] We report on extreme penetration power of relativistic electrons in a micrometer-thick gallium nitride epitaxial film and its application to probing threading dislocations, which were introduced during crystal growth. Maximum usable thickness of the specimen was quantitatively eval...

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Detalles Bibliográficos
Autores principales: Sato, Kazuhisa, Yasuda, Hidehiro
Formato: Online Artículo Texto
Lenguaje:English
Publicado: American Chemical Society 2018
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC6644655/
https://www.ncbi.nlm.nih.gov/pubmed/31458059
http://dx.doi.org/10.1021/acsomega.8b02078