Magnetic and Electrical Performance of Atomic Layer Deposited Iron Erbium Oxide Thin Films

[Image: see text] Mixed films of a high-permittivity oxide, Er(2)O(3), and a magnetic material, Fe(2)O(3), were grown by atomic layer deposition on silicon and titanium nitride at 375 °C using erbium diketonate, ferrocene, and ozone as precursors. Crystalline phases of erbium and iron oxides were fo...

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Autores principales: Tamm, Aile, Kalam, Kristjan, Seemen, Helina, Kozlova, Jekaterina, Kukli, Kaupo, Aarik, Jaan, Link, Joosep, Stern, Raivo, Dueñas, Salvador, Castán, Helena
Formato: Online Artículo Texto
Lenguaje:English
Publicado: American Chemical Society 2017
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC6645657/
https://www.ncbi.nlm.nih.gov/pubmed/31457414
http://dx.doi.org/10.1021/acsomega.7b01394
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author Tamm, Aile
Kalam, Kristjan
Seemen, Helina
Kozlova, Jekaterina
Kukli, Kaupo
Aarik, Jaan
Link, Joosep
Stern, Raivo
Dueñas, Salvador
Castán, Helena
author_facet Tamm, Aile
Kalam, Kristjan
Seemen, Helina
Kozlova, Jekaterina
Kukli, Kaupo
Aarik, Jaan
Link, Joosep
Stern, Raivo
Dueñas, Salvador
Castán, Helena
author_sort Tamm, Aile
collection PubMed
description [Image: see text] Mixed films of a high-permittivity oxide, Er(2)O(3), and a magnetic material, Fe(2)O(3), were grown by atomic layer deposition on silicon and titanium nitride at 375 °C using erbium diketonate, ferrocene, and ozone as precursors. Crystalline phases of erbium and iron oxides were formed. Growth into three-dimensional trenched structures was demonstrated. A structure deposited using tens to hundreds subsequent cycles for both constituent metal oxide layers promoted both charge polarization and saturative magnetization compared to those in the more homogeneously mixed films.
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spelling pubmed-66456572019-08-27 Magnetic and Electrical Performance of Atomic Layer Deposited Iron Erbium Oxide Thin Films Tamm, Aile Kalam, Kristjan Seemen, Helina Kozlova, Jekaterina Kukli, Kaupo Aarik, Jaan Link, Joosep Stern, Raivo Dueñas, Salvador Castán, Helena ACS Omega [Image: see text] Mixed films of a high-permittivity oxide, Er(2)O(3), and a magnetic material, Fe(2)O(3), were grown by atomic layer deposition on silicon and titanium nitride at 375 °C using erbium diketonate, ferrocene, and ozone as precursors. Crystalline phases of erbium and iron oxides were formed. Growth into three-dimensional trenched structures was demonstrated. A structure deposited using tens to hundreds subsequent cycles for both constituent metal oxide layers promoted both charge polarization and saturative magnetization compared to those in the more homogeneously mixed films. American Chemical Society 2017-12-11 /pmc/articles/PMC6645657/ /pubmed/31457414 http://dx.doi.org/10.1021/acsomega.7b01394 Text en Copyright © 2017 American Chemical Society This is an open access article published under an ACS AuthorChoice License (http://pubs.acs.org/page/policy/authorchoice_termsofuse.html) , which permits copying and redistribution of the article or any adaptations for non-commercial purposes.
spellingShingle Tamm, Aile
Kalam, Kristjan
Seemen, Helina
Kozlova, Jekaterina
Kukli, Kaupo
Aarik, Jaan
Link, Joosep
Stern, Raivo
Dueñas, Salvador
Castán, Helena
Magnetic and Electrical Performance of Atomic Layer Deposited Iron Erbium Oxide Thin Films
title Magnetic and Electrical Performance of Atomic Layer Deposited Iron Erbium Oxide Thin Films
title_full Magnetic and Electrical Performance of Atomic Layer Deposited Iron Erbium Oxide Thin Films
title_fullStr Magnetic and Electrical Performance of Atomic Layer Deposited Iron Erbium Oxide Thin Films
title_full_unstemmed Magnetic and Electrical Performance of Atomic Layer Deposited Iron Erbium Oxide Thin Films
title_short Magnetic and Electrical Performance of Atomic Layer Deposited Iron Erbium Oxide Thin Films
title_sort magnetic and electrical performance of atomic layer deposited iron erbium oxide thin films
url https://www.ncbi.nlm.nih.gov/pmc/articles/PMC6645657/
https://www.ncbi.nlm.nih.gov/pubmed/31457414
http://dx.doi.org/10.1021/acsomega.7b01394
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