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Magnetic and Electrical Performance of Atomic Layer Deposited Iron Erbium Oxide Thin Films
[Image: see text] Mixed films of a high-permittivity oxide, Er(2)O(3), and a magnetic material, Fe(2)O(3), were grown by atomic layer deposition on silicon and titanium nitride at 375 °C using erbium diketonate, ferrocene, and ozone as precursors. Crystalline phases of erbium and iron oxides were fo...
| Autores principales: | , , , , , , , , , |
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| Formato: | Online Artículo Texto |
| Lenguaje: | English |
| Publicado: |
American Chemical Society
2017
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| Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC6645657/ https://www.ncbi.nlm.nih.gov/pubmed/31457414 http://dx.doi.org/10.1021/acsomega.7b01394 |