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On the Dynamics of Intrinsic Carbon in Copper during the Annealing Phase of Chemical Vapor Deposition Growth of Graphene
[Image: see text] In chemical vapor deposition (CVD) growth of graphene, intrinsic carbon in copper has been shown to play a role, especially during the nucleation phase. Here, we report experimental results on depletion of carbon from the bulk of a Cu foil to its surface at different hydrogen press...
Autores principales: | , |
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Formato: | Online Artículo Texto |
Lenguaje: | English |
Publicado: |
American Chemical Society
2019
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Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC6647976/ https://www.ncbi.nlm.nih.gov/pubmed/31460053 http://dx.doi.org/10.1021/acsomega.9b00681 |
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author | Khaksaran, M. Hadi Kaya, Ismet I. |
author_facet | Khaksaran, M. Hadi Kaya, Ismet I. |
author_sort | Khaksaran, M. Hadi |
collection | PubMed |
description | [Image: see text] In chemical vapor deposition (CVD) growth of graphene, intrinsic carbon in copper has been shown to play a role, especially during the nucleation phase. Here, we report experimental results on depletion of carbon from the bulk of a Cu foil to its surface at different hydrogen pressures, which explain new aspects of the interplay between hydrogen and intrinsic carbon prior to growth. We observed that rising H(2) pressure boosts carbon depletion to the surface, but at the same time, at elevated H(2) pressures, the graphitic film formed on the Cu surface is etched away at a faster rate. This effect led us to practice annealing of copper under high hydrogen pressure as an approach to decrease the total content of carbon in the copper foil and consequently reducing the nucleation density of graphene flakes. These results enhance our understanding about the role of H(2) in the CVD process and explain some of the inconsistencies among the earlier reports. |
format | Online Article Text |
id | pubmed-6647976 |
institution | National Center for Biotechnology Information |
language | English |
publishDate | 2019 |
publisher | American Chemical Society |
record_format | MEDLINE/PubMed |
spelling | pubmed-66479762019-08-27 On the Dynamics of Intrinsic Carbon in Copper during the Annealing Phase of Chemical Vapor Deposition Growth of Graphene Khaksaran, M. Hadi Kaya, Ismet I. ACS Omega [Image: see text] In chemical vapor deposition (CVD) growth of graphene, intrinsic carbon in copper has been shown to play a role, especially during the nucleation phase. Here, we report experimental results on depletion of carbon from the bulk of a Cu foil to its surface at different hydrogen pressures, which explain new aspects of the interplay between hydrogen and intrinsic carbon prior to growth. We observed that rising H(2) pressure boosts carbon depletion to the surface, but at the same time, at elevated H(2) pressures, the graphitic film formed on the Cu surface is etched away at a faster rate. This effect led us to practice annealing of copper under high hydrogen pressure as an approach to decrease the total content of carbon in the copper foil and consequently reducing the nucleation density of graphene flakes. These results enhance our understanding about the role of H(2) in the CVD process and explain some of the inconsistencies among the earlier reports. American Chemical Society 2019-06-03 /pmc/articles/PMC6647976/ /pubmed/31460053 http://dx.doi.org/10.1021/acsomega.9b00681 Text en Copyright © 2019 American Chemical Society This is an open access article published under an ACS AuthorChoice License (http://pubs.acs.org/page/policy/authorchoice_termsofuse.html) , which permits copying and redistribution of the article or any adaptations for non-commercial purposes. |
spellingShingle | Khaksaran, M. Hadi Kaya, Ismet I. On the Dynamics of Intrinsic Carbon in Copper during the Annealing Phase of Chemical Vapor Deposition Growth of Graphene |
title | On the Dynamics of Intrinsic Carbon in Copper during
the Annealing Phase of Chemical Vapor Deposition Growth of Graphene |
title_full | On the Dynamics of Intrinsic Carbon in Copper during
the Annealing Phase of Chemical Vapor Deposition Growth of Graphene |
title_fullStr | On the Dynamics of Intrinsic Carbon in Copper during
the Annealing Phase of Chemical Vapor Deposition Growth of Graphene |
title_full_unstemmed | On the Dynamics of Intrinsic Carbon in Copper during
the Annealing Phase of Chemical Vapor Deposition Growth of Graphene |
title_short | On the Dynamics of Intrinsic Carbon in Copper during
the Annealing Phase of Chemical Vapor Deposition Growth of Graphene |
title_sort | on the dynamics of intrinsic carbon in copper during
the annealing phase of chemical vapor deposition growth of graphene |
url | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC6647976/ https://www.ncbi.nlm.nih.gov/pubmed/31460053 http://dx.doi.org/10.1021/acsomega.9b00681 |
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