Fabrication of Tapered Micropillars with High Aspect-Ratio Based on Deep X-ray Lithography

In this study, a fabrication method of tapered microstructures with high aspect ratio was proposed by deep X-ray lithography. Tapered microstructures with several hundred micrometers and high aspect ratio are demanded owing to the high applicability in the fields of various microelectromechanical sy...

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Detalles Bibliográficos
Autores principales: Park, Jae Man, Kim, Jong Hyun, Han, Jun Sae, Shin, Da Seul, Park, Sung Cheol, Son, Seong Ho, Park, Seong Jin
Formato: Online Artículo Texto
Lenguaje:English
Publicado: MDPI 2019
Materias:
Article
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC6651585/
https://www.ncbi.nlm.nih.gov/pubmed/31247998
http://dx.doi.org/10.3390/ma12132056

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC6651585/
https://www.ncbi.nlm.nih.gov/pubmed/31247998
http://dx.doi.org/10.3390/ma12132056

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