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Fabrication of Tapered Micropillars with High Aspect-Ratio Based on Deep X-ray Lithography
In this study, a fabrication method of tapered microstructures with high aspect ratio was proposed by deep X-ray lithography. Tapered microstructures with several hundred micrometers and high aspect ratio are demanded owing to the high applicability in the fields of various microelectromechanical sy...
Autores principales: | Park, Jae Man, Kim, Jong Hyun, Han, Jun Sae, Shin, Da Seul, Park, Sung Cheol, Son, Seong Ho, Park, Seong Jin |
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Formato: | Online Artículo Texto |
Lenguaje: | English |
Publicado: |
MDPI
2019
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Materias: | |
Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC6651585/ https://www.ncbi.nlm.nih.gov/pubmed/31247998 http://dx.doi.org/10.3390/ma12132056 |
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