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Large area growth of few-layer In(2)Te(3) films by chemical vapor deposition and its magnetoresistance properties
In this work we report a facile route to grow large area, uniform, continuous and few-layer α-In(2)Te(3) film via chemical vapor deposition (CVD) methods. The characterizations show the large area of CVD-grown few-layer α-In(2)Te(3). This method guarantees the precise control of thickness down to fe...
| Autores principales: | , , , , , |
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| Formato: | Online Artículo Texto |
| Lenguaje: | English |
| Publicado: |
Nature Publishing Group UK
2019
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| Materias: | |
| Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC6662755/ https://www.ncbi.nlm.nih.gov/pubmed/31358867 http://dx.doi.org/10.1038/s41598-019-47520-x |