Large area growth of few-layer In(2)Te(3) films by chemical vapor deposition and its magnetoresistance properties

In this work we report a facile route to grow large area, uniform, continuous and few-layer α-In(2)Te(3) film via chemical vapor deposition (CVD) methods. The characterizations show the large area of CVD-grown few-layer α-In(2)Te(3). This method guarantees the precise control of thickness down to fe...

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Detalles Bibliográficos
Autores principales: Zhang, Shaohui, Zhang, Jingyang, Liu, Baosheng, Jia, Xiaobo, Wang, Guofu, Chang, Haixin
Formato: Online Artículo Texto
Lenguaje:English
Publicado: Nature Publishing Group UK 2019
Materias:
Article
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC6662755/
https://www.ncbi.nlm.nih.gov/pubmed/31358867
http://dx.doi.org/10.1038/s41598-019-47520-x

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