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Water‐Based Solution Processing and Wafer‐Scale Integration of All‐Graphene Humidity Sensors

One of the main advantages of 2D materials for various applications is that they can be prepared in form of water‐based solutions. The high yield and cost‐effectiveness of this method make them of great interest for printed electronics, composites, and bio‐ and healthcare technologies. However, once...

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Detalles Bibliográficos
Autores principales: Torres Alonso, Elias, Shin, Dong‐Wook, Rajan, Gopika, Neves, Ana I. S., Russo, Saverio, Craciun, Monica F.
Formato: Online Artículo Texto
Lenguaje:English
Publicado: John Wiley and Sons Inc. 2019
Materias:
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC6685499/
https://www.ncbi.nlm.nih.gov/pubmed/31406661
http://dx.doi.org/10.1002/advs.201802318
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author Torres Alonso, Elias
Shin, Dong‐Wook
Rajan, Gopika
Neves, Ana I. S.
Russo, Saverio
Craciun, Monica F.
author_facet Torres Alonso, Elias
Shin, Dong‐Wook
Rajan, Gopika
Neves, Ana I. S.
Russo, Saverio
Craciun, Monica F.
author_sort Torres Alonso, Elias
collection PubMed
description One of the main advantages of 2D materials for various applications is that they can be prepared in form of water‐based solutions. The high yield and cost‐effectiveness of this method make them of great interest for printed electronics, composites, and bio‐ and healthcare technologies. However, once deposited on a substrate, etching away these solution‐processed materials is a difficult task, yet crucial for pattern definition and thus device fabrication. In particular, the realization of micrometer‐sized patterns requires mesh and paste optimization when screen‐printed or solvent‐engineered and surface functionalization when inkjet‐printed, both usually involving additional postdeposition steps. These constraints are holding back the integration of these 2D materials in devices and applications. In this work, a method for the fabrication of micrometer‐sized well‐defined patterns in water‐based 2D materials is presented, with an extensive characterization of the films and patterns obtained. The method is ultimately used to create humidity sensors with performance comparable to that of commercial ones. These sensor devices are fabricated onto a 4′ silicon and polyethylene terephthalate (PET) wafers to create all‐graphene humidity sensors that are flexible, transparent, and compatible with current complementary metal–oxide–semiconductor (CMOS) and roll‐to‐roll workflows.
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spelling pubmed-66854992019-08-12 Water‐Based Solution Processing and Wafer‐Scale Integration of All‐Graphene Humidity Sensors Torres Alonso, Elias Shin, Dong‐Wook Rajan, Gopika Neves, Ana I. S. Russo, Saverio Craciun, Monica F. Adv Sci (Weinh) Communications One of the main advantages of 2D materials for various applications is that they can be prepared in form of water‐based solutions. The high yield and cost‐effectiveness of this method make them of great interest for printed electronics, composites, and bio‐ and healthcare technologies. However, once deposited on a substrate, etching away these solution‐processed materials is a difficult task, yet crucial for pattern definition and thus device fabrication. In particular, the realization of micrometer‐sized patterns requires mesh and paste optimization when screen‐printed or solvent‐engineered and surface functionalization when inkjet‐printed, both usually involving additional postdeposition steps. These constraints are holding back the integration of these 2D materials in devices and applications. In this work, a method for the fabrication of micrometer‐sized well‐defined patterns in water‐based 2D materials is presented, with an extensive characterization of the films and patterns obtained. The method is ultimately used to create humidity sensors with performance comparable to that of commercial ones. These sensor devices are fabricated onto a 4′ silicon and polyethylene terephthalate (PET) wafers to create all‐graphene humidity sensors that are flexible, transparent, and compatible with current complementary metal–oxide–semiconductor (CMOS) and roll‐to‐roll workflows. John Wiley and Sons Inc. 2019-05-28 /pmc/articles/PMC6685499/ /pubmed/31406661 http://dx.doi.org/10.1002/advs.201802318 Text en © 2019 The Authors. Published by WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim This is an open access article under the terms of the http://creativecommons.org/licenses/by/4.0/ License, which permits use, distribution and reproduction in any medium, provided the original work is properly cited.
spellingShingle Communications
Torres Alonso, Elias
Shin, Dong‐Wook
Rajan, Gopika
Neves, Ana I. S.
Russo, Saverio
Craciun, Monica F.
Water‐Based Solution Processing and Wafer‐Scale Integration of All‐Graphene Humidity Sensors
title Water‐Based Solution Processing and Wafer‐Scale Integration of All‐Graphene Humidity Sensors
title_full Water‐Based Solution Processing and Wafer‐Scale Integration of All‐Graphene Humidity Sensors
title_fullStr Water‐Based Solution Processing and Wafer‐Scale Integration of All‐Graphene Humidity Sensors
title_full_unstemmed Water‐Based Solution Processing and Wafer‐Scale Integration of All‐Graphene Humidity Sensors
title_short Water‐Based Solution Processing and Wafer‐Scale Integration of All‐Graphene Humidity Sensors
title_sort water‐based solution processing and wafer‐scale integration of all‐graphene humidity sensors
topic Communications
url https://www.ncbi.nlm.nih.gov/pmc/articles/PMC6685499/
https://www.ncbi.nlm.nih.gov/pubmed/31406661
http://dx.doi.org/10.1002/advs.201802318
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