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Analytics-statistics mixed training and its fitness to semisupervised manufacturing
While there have been many studies using machine learning (ML) algorithms to predict process outcomes and device performance in semiconductor manufacturing, the extensively developed technology computer-aided design (TCAD) physical models should play a more significant role in conjunction with ML. W...
Autores principales: | , , , , , , , , |
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Formato: | Online Artículo Texto |
Lenguaje: | English |
Publicado: |
Public Library of Science
2019
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Materias: | |
Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC6692054/ https://www.ncbi.nlm.nih.gov/pubmed/31408473 http://dx.doi.org/10.1371/journal.pone.0220607 |
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author | Parashar, Parag Chen, Chun Han Akbar, Chandni Fu, Sze Ming Rawat, Tejender S. Pratik, Sparsh Butola, Rajat Chen, Shih Han Lin, Albert S. |
author_facet | Parashar, Parag Chen, Chun Han Akbar, Chandni Fu, Sze Ming Rawat, Tejender S. Pratik, Sparsh Butola, Rajat Chen, Shih Han Lin, Albert S. |
author_sort | Parashar, Parag |
collection | PubMed |
description | While there have been many studies using machine learning (ML) algorithms to predict process outcomes and device performance in semiconductor manufacturing, the extensively developed technology computer-aided design (TCAD) physical models should play a more significant role in conjunction with ML. While TCAD models have been effective in predicting the trends of experiments, a machine learning statistical model is more capable of predicting the anomalous effects that can be dependent on the chambers, machines, fabrication environment, and specific layouts. In this paper, we use an analytics-statistics mixed training (ASMT) approach using TCAD. Under this method, the TCAD models are incorporated into the machine learning training procedure. The mixed dataset with the experimental and TCAD results improved the prediction in terms of accuracy. With the application of ASMT to the BOSCH process, we show that the mean square error (MSE) can be effectively decreased when the analytics-statistics mixed training (ASMT) scheme is used instead of the classic neural network (NN) used in the baseline study. In this method, statistical induction and analytical deduction can be combined to increase the prediction accuracy of future intelligent semiconductor manufacturing. |
format | Online Article Text |
id | pubmed-6692054 |
institution | National Center for Biotechnology Information |
language | English |
publishDate | 2019 |
publisher | Public Library of Science |
record_format | MEDLINE/PubMed |
spelling | pubmed-66920542019-08-30 Analytics-statistics mixed training and its fitness to semisupervised manufacturing Parashar, Parag Chen, Chun Han Akbar, Chandni Fu, Sze Ming Rawat, Tejender S. Pratik, Sparsh Butola, Rajat Chen, Shih Han Lin, Albert S. PLoS One Research Article While there have been many studies using machine learning (ML) algorithms to predict process outcomes and device performance in semiconductor manufacturing, the extensively developed technology computer-aided design (TCAD) physical models should play a more significant role in conjunction with ML. While TCAD models have been effective in predicting the trends of experiments, a machine learning statistical model is more capable of predicting the anomalous effects that can be dependent on the chambers, machines, fabrication environment, and specific layouts. In this paper, we use an analytics-statistics mixed training (ASMT) approach using TCAD. Under this method, the TCAD models are incorporated into the machine learning training procedure. The mixed dataset with the experimental and TCAD results improved the prediction in terms of accuracy. With the application of ASMT to the BOSCH process, we show that the mean square error (MSE) can be effectively decreased when the analytics-statistics mixed training (ASMT) scheme is used instead of the classic neural network (NN) used in the baseline study. In this method, statistical induction and analytical deduction can be combined to increase the prediction accuracy of future intelligent semiconductor manufacturing. Public Library of Science 2019-08-13 /pmc/articles/PMC6692054/ /pubmed/31408473 http://dx.doi.org/10.1371/journal.pone.0220607 Text en © 2019 Parashar et al http://creativecommons.org/licenses/by/4.0/ This is an open access article distributed under the terms of the Creative Commons Attribution License (http://creativecommons.org/licenses/by/4.0/) , which permits unrestricted use, distribution, and reproduction in any medium, provided the original author and source are credited. |
spellingShingle | Research Article Parashar, Parag Chen, Chun Han Akbar, Chandni Fu, Sze Ming Rawat, Tejender S. Pratik, Sparsh Butola, Rajat Chen, Shih Han Lin, Albert S. Analytics-statistics mixed training and its fitness to semisupervised manufacturing |
title | Analytics-statistics mixed training and its fitness to semisupervised manufacturing |
title_full | Analytics-statistics mixed training and its fitness to semisupervised manufacturing |
title_fullStr | Analytics-statistics mixed training and its fitness to semisupervised manufacturing |
title_full_unstemmed | Analytics-statistics mixed training and its fitness to semisupervised manufacturing |
title_short | Analytics-statistics mixed training and its fitness to semisupervised manufacturing |
title_sort | analytics-statistics mixed training and its fitness to semisupervised manufacturing |
topic | Research Article |
url | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC6692054/ https://www.ncbi.nlm.nih.gov/pubmed/31408473 http://dx.doi.org/10.1371/journal.pone.0220607 |
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