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Design, Modeling, and Fabrication of High-Speed VCSEL with Data Rate up to 50 Gb/s
We have studied the characteristics of frequency response at 850-nm GaAs high-speed vertical-cavity surface-emitting lasers (VCSELs) with different kinds of oxide aperture sizes and cavity length using the PICS3D simulation program. Using 5-μm oxide aperture sizes, the frequency response behavior ca...
Autores principales: | , , , , , , , , , , , , , , |
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Formato: | Online Artículo Texto |
Lenguaje: | English |
Publicado: |
Springer US
2019
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Materias: | |
Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC6694349/ https://www.ncbi.nlm.nih.gov/pubmed/31414236 http://dx.doi.org/10.1186/s11671-019-3107-7 |
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author | Shen, Chih-Chiang Hsu, Tsung-Chi Yeh, Yen-Wei Kang, Chieh-Yu Lu, Yun-Ting Lin, Hon-Way Tseng, Hsien-Yao Chen, Yu-Tzu Chen, Cheng-Yuan Lin, Chien-Chung Wu, Chao-Hsin Lee, Po-Tsung Sheng, Yang Chiu, Ching-Hsueh Kuo, Hao-Chung |
author_facet | Shen, Chih-Chiang Hsu, Tsung-Chi Yeh, Yen-Wei Kang, Chieh-Yu Lu, Yun-Ting Lin, Hon-Way Tseng, Hsien-Yao Chen, Yu-Tzu Chen, Cheng-Yuan Lin, Chien-Chung Wu, Chao-Hsin Lee, Po-Tsung Sheng, Yang Chiu, Ching-Hsueh Kuo, Hao-Chung |
author_sort | Shen, Chih-Chiang |
collection | PubMed |
description | We have studied the characteristics of frequency response at 850-nm GaAs high-speed vertical-cavity surface-emitting lasers (VCSELs) with different kinds of oxide aperture sizes and cavity length using the PICS3D simulation program. Using 5-μm oxide aperture sizes, the frequency response behavior can be improved from 18.4 GHz and 15.5 GHz to 21.2 GHz and 19 GHz in a maximum of 3 dB at 25 °C and 85 °C, respectively. Numerical simulation results also suggest that the frequency response performances improved from 21.2 GHz and 19 GHz to 30.5 GHz and 24.5 GHz in a maximum of 3 dB at 25 °C and 85 °C due to the reduction of cavity length from 3λ/2 to λ/2. Consequently, the high-speed VCSEL devices were fabricated on a modified structure and exhibited 50-Gb/s data rate at 85 °C. |
format | Online Article Text |
id | pubmed-6694349 |
institution | National Center for Biotechnology Information |
language | English |
publishDate | 2019 |
publisher | Springer US |
record_format | MEDLINE/PubMed |
spelling | pubmed-66943492019-08-28 Design, Modeling, and Fabrication of High-Speed VCSEL with Data Rate up to 50 Gb/s Shen, Chih-Chiang Hsu, Tsung-Chi Yeh, Yen-Wei Kang, Chieh-Yu Lu, Yun-Ting Lin, Hon-Way Tseng, Hsien-Yao Chen, Yu-Tzu Chen, Cheng-Yuan Lin, Chien-Chung Wu, Chao-Hsin Lee, Po-Tsung Sheng, Yang Chiu, Ching-Hsueh Kuo, Hao-Chung Nanoscale Res Lett Nano Express We have studied the characteristics of frequency response at 850-nm GaAs high-speed vertical-cavity surface-emitting lasers (VCSELs) with different kinds of oxide aperture sizes and cavity length using the PICS3D simulation program. Using 5-μm oxide aperture sizes, the frequency response behavior can be improved from 18.4 GHz and 15.5 GHz to 21.2 GHz and 19 GHz in a maximum of 3 dB at 25 °C and 85 °C, respectively. Numerical simulation results also suggest that the frequency response performances improved from 21.2 GHz and 19 GHz to 30.5 GHz and 24.5 GHz in a maximum of 3 dB at 25 °C and 85 °C due to the reduction of cavity length from 3λ/2 to λ/2. Consequently, the high-speed VCSEL devices were fabricated on a modified structure and exhibited 50-Gb/s data rate at 85 °C. Springer US 2019-08-14 /pmc/articles/PMC6694349/ /pubmed/31414236 http://dx.doi.org/10.1186/s11671-019-3107-7 Text en © The Author(s). 2019 Open AccessThis article is distributed under the terms of the Creative Commons Attribution 4.0 International License (http://creativecommons.org/licenses/by/4.0/), which permits unrestricted use, distribution, and reproduction in any medium, provided you give appropriate credit to the original author(s) and the source, provide a link to the Creative Commons license, and indicate if changes were made. |
spellingShingle | Nano Express Shen, Chih-Chiang Hsu, Tsung-Chi Yeh, Yen-Wei Kang, Chieh-Yu Lu, Yun-Ting Lin, Hon-Way Tseng, Hsien-Yao Chen, Yu-Tzu Chen, Cheng-Yuan Lin, Chien-Chung Wu, Chao-Hsin Lee, Po-Tsung Sheng, Yang Chiu, Ching-Hsueh Kuo, Hao-Chung Design, Modeling, and Fabrication of High-Speed VCSEL with Data Rate up to 50 Gb/s |
title | Design, Modeling, and Fabrication of High-Speed VCSEL with Data Rate up to 50 Gb/s |
title_full | Design, Modeling, and Fabrication of High-Speed VCSEL with Data Rate up to 50 Gb/s |
title_fullStr | Design, Modeling, and Fabrication of High-Speed VCSEL with Data Rate up to 50 Gb/s |
title_full_unstemmed | Design, Modeling, and Fabrication of High-Speed VCSEL with Data Rate up to 50 Gb/s |
title_short | Design, Modeling, and Fabrication of High-Speed VCSEL with Data Rate up to 50 Gb/s |
title_sort | design, modeling, and fabrication of high-speed vcsel with data rate up to 50 gb/s |
topic | Nano Express |
url | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC6694349/ https://www.ncbi.nlm.nih.gov/pubmed/31414236 http://dx.doi.org/10.1186/s11671-019-3107-7 |
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