Atomistic Simulations of Plasma-Enhanced Atomic Layer Deposition

Plasma-enhanced atomic layer deposition (PEALD) is a widely used, powerful layer-by-layer coating technology. Here, we present an atomistic simulation scheme for PEALD processes, combining the Monte Carlo deposition algorithm and structure relaxation using molecular dynamics. In contrast to previous...

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Detalles Bibliográficos
Autores principales: Becker, Martin, Sierka, Marek
Formato: Online Artículo Texto
Lenguaje:English
Publicado: MDPI 2019
Materias:
Article
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC6719897/
https://www.ncbi.nlm.nih.gov/pubmed/31443331
http://dx.doi.org/10.3390/ma12162605

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC6719897/
https://www.ncbi.nlm.nih.gov/pubmed/31443331
http://dx.doi.org/10.3390/ma12162605

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