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Substrate Temperature Dependent Microstructure and Electron-Induced Secondary Electron Emission Properties of Magnetron Sputter-Deposited Amorphous Carbon Films

For special instruments or equipments including particle accelerators, space microwave devices and spacecrafts, the suppression for electron-induced secondary electron emission (SEE) occurring on the component surfaces is of great significance due to a negative influence caused by SEE on their norma...

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Autores principales: Li, Jie, Yi, Xingkang, Hu, Wenbo, Gao, Buyu, Li, Yongdong, Wu, Shengli, Lin, Shu, Zhang, Jintao
Formato: Online Artículo Texto
Lenguaje:English
Publicado: MDPI 2019
Materias:
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC6720795/
https://www.ncbi.nlm.nih.gov/pubmed/31430848
http://dx.doi.org/10.3390/ma12162631
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author Li, Jie
Yi, Xingkang
Hu, Wenbo
Gao, Buyu
Li, Yongdong
Wu, Shengli
Lin, Shu
Zhang, Jintao
author_facet Li, Jie
Yi, Xingkang
Hu, Wenbo
Gao, Buyu
Li, Yongdong
Wu, Shengli
Lin, Shu
Zhang, Jintao
author_sort Li, Jie
collection PubMed
description For special instruments or equipments including particle accelerators, space microwave devices and spacecrafts, the suppression for electron-induced secondary electron emission (SEE) occurring on the component surfaces is of great significance due to a negative influence caused by SEE on their normal operations. In this paper, amorphous carbon (a-C) films were prepared on stainless-steel substrates by radio frequency magnetron sputtering, and the effects of substrate temperature (T(s)) and continuous electron bombardment on the microstructure and secondary electron emission yield (SEY) of a-C film were investigated in order to achieve a better inhibition for SEE. The experimental results show that a rise of T(s) during the a-C film preparation is conducive to a SEY reduction and an increase of multipactor threshold due to the increases of surface roughness and sp(2) bond content. In addition, although the SEY of a-C film has a slight increase with the rise of electron bombardment time, the a-C film sample with a lower SEY keeps its lower SEY all the time during continuous electron bombardment. The a-C film prepared at T(s) of 500 °C has the lowest SEY peak value of 1.09 with a reduction of 30.6% in comparison with the stainless-steel substrate.
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spelling pubmed-67207952019-09-10 Substrate Temperature Dependent Microstructure and Electron-Induced Secondary Electron Emission Properties of Magnetron Sputter-Deposited Amorphous Carbon Films Li, Jie Yi, Xingkang Hu, Wenbo Gao, Buyu Li, Yongdong Wu, Shengli Lin, Shu Zhang, Jintao Materials (Basel) Article For special instruments or equipments including particle accelerators, space microwave devices and spacecrafts, the suppression for electron-induced secondary electron emission (SEE) occurring on the component surfaces is of great significance due to a negative influence caused by SEE on their normal operations. In this paper, amorphous carbon (a-C) films were prepared on stainless-steel substrates by radio frequency magnetron sputtering, and the effects of substrate temperature (T(s)) and continuous electron bombardment on the microstructure and secondary electron emission yield (SEY) of a-C film were investigated in order to achieve a better inhibition for SEE. The experimental results show that a rise of T(s) during the a-C film preparation is conducive to a SEY reduction and an increase of multipactor threshold due to the increases of surface roughness and sp(2) bond content. In addition, although the SEY of a-C film has a slight increase with the rise of electron bombardment time, the a-C film sample with a lower SEY keeps its lower SEY all the time during continuous electron bombardment. The a-C film prepared at T(s) of 500 °C has the lowest SEY peak value of 1.09 with a reduction of 30.6% in comparison with the stainless-steel substrate. MDPI 2019-08-19 /pmc/articles/PMC6720795/ /pubmed/31430848 http://dx.doi.org/10.3390/ma12162631 Text en © 2019 by the authors. Licensee MDPI, Basel, Switzerland. This article is an open access article distributed under the terms and conditions of the Creative Commons Attribution (CC BY) license (http://creativecommons.org/licenses/by/4.0/).
spellingShingle Article
Li, Jie
Yi, Xingkang
Hu, Wenbo
Gao, Buyu
Li, Yongdong
Wu, Shengli
Lin, Shu
Zhang, Jintao
Substrate Temperature Dependent Microstructure and Electron-Induced Secondary Electron Emission Properties of Magnetron Sputter-Deposited Amorphous Carbon Films
title Substrate Temperature Dependent Microstructure and Electron-Induced Secondary Electron Emission Properties of Magnetron Sputter-Deposited Amorphous Carbon Films
title_full Substrate Temperature Dependent Microstructure and Electron-Induced Secondary Electron Emission Properties of Magnetron Sputter-Deposited Amorphous Carbon Films
title_fullStr Substrate Temperature Dependent Microstructure and Electron-Induced Secondary Electron Emission Properties of Magnetron Sputter-Deposited Amorphous Carbon Films
title_full_unstemmed Substrate Temperature Dependent Microstructure and Electron-Induced Secondary Electron Emission Properties of Magnetron Sputter-Deposited Amorphous Carbon Films
title_short Substrate Temperature Dependent Microstructure and Electron-Induced Secondary Electron Emission Properties of Magnetron Sputter-Deposited Amorphous Carbon Films
title_sort substrate temperature dependent microstructure and electron-induced secondary electron emission properties of magnetron sputter-deposited amorphous carbon films
topic Article
url https://www.ncbi.nlm.nih.gov/pmc/articles/PMC6720795/
https://www.ncbi.nlm.nih.gov/pubmed/31430848
http://dx.doi.org/10.3390/ma12162631
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