Cargando…
Substrate Temperature Dependent Microstructure and Electron-Induced Secondary Electron Emission Properties of Magnetron Sputter-Deposited Amorphous Carbon Films
For special instruments or equipments including particle accelerators, space microwave devices and spacecrafts, the suppression for electron-induced secondary electron emission (SEE) occurring on the component surfaces is of great significance due to a negative influence caused by SEE on their norma...
Autores principales: | Li, Jie, Yi, Xingkang, Hu, Wenbo, Gao, Buyu, Li, Yongdong, Wu, Shengli, Lin, Shu, Zhang, Jintao |
---|---|
Formato: | Online Artículo Texto |
Lenguaje: | English |
Publicado: |
MDPI
2019
|
Materias: | |
Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC6720795/ https://www.ncbi.nlm.nih.gov/pubmed/31430848 http://dx.doi.org/10.3390/ma12162631 |
Ejemplares similares
-
Au Doping Effect on the Secondary Electron Emission Performance of MgO Films
por: Li, Jie, et al.
Publicado: (2018) -
Microstructure and Oxidation Behavior of Metal V Films Deposited by Magnetron Sputtering
por: Zhang, Song, et al.
Publicado: (2019) -
Review on Hydrophobic Thin Films Prepared Using Magnetron Sputtering Deposition
por: Ju, Yuxin, et al.
Publicado: (2023) -
HRTEM Microstructural Characterization of β-WO(3) Thin Films Deposited by Reactive RF Magnetron Sputtering
por: Faudoa-Arzate, A., et al.
Publicado: (2017) -
Investigation of the Microstructure, Optical, Electrical and Nanomechanical Properties of ZnOx Thin Films Deposited by Magnetron Sputtering
por: Mazur, Michał, et al.
Publicado: (2022)