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Sintering Copper Nanoparticles with Photonic Additive for Printed Conductive Patterns by Intense Pulsed Light

In this study, an ink formulation was developed to prepare conductive copper thin films with compact structure by using intense pulsed light (IPL) sintering. To improve inter-particle connections in the sintering process, a cuprous oxide shell was synthesized over copper nanoparticles (CuNP). This c...

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Autores principales: Chung, Wan-Yu, Lai, Yi-Chin, Yonezawa, Tetsu, Liao, Ying-Chih
Formato: Online Artículo Texto
Lenguaje:English
Publicado: MDPI 2019
Materias:
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC6723544/
https://www.ncbi.nlm.nih.gov/pubmed/31349711
http://dx.doi.org/10.3390/nano9081071
_version_ 1783448793824362496
author Chung, Wan-Yu
Lai, Yi-Chin
Yonezawa, Tetsu
Liao, Ying-Chih
author_facet Chung, Wan-Yu
Lai, Yi-Chin
Yonezawa, Tetsu
Liao, Ying-Chih
author_sort Chung, Wan-Yu
collection PubMed
description In this study, an ink formulation was developed to prepare conductive copper thin films with compact structure by using intense pulsed light (IPL) sintering. To improve inter-particle connections in the sintering process, a cuprous oxide shell was synthesized over copper nanoparticles (CuNP). This cuprous oxide shell can be reduced by IPL with the presence of a reductant and fused to form connection between large copper particles. However, the thermal yield stress after strong IPL sintering resulted in cracks of conductive copper film. Thus, a multiple pulse sintering with an off time of 2 s was needed to reach a low resistivity of 10(−5) Ω·cm. To increase the light absorption efficiency and to further decrease voids between CuNPs in the copper film, cupric oxide nanoparticles (CuONP) of 50 nm, were also added into ink. The results showed that these CuONPs can be reduced to copper with a single pulse IPL and fused with the surrounding CuNPs. With an optimal CuNP/CuONP weight ratio of 1/80, the copper film showed a lowest resistivity of 7 × 10(−5) Ω·cm, ~25% conductivity of bulk copper, with a single sintering energy at 3.08 J/cm(2). The ink can be printed on flexible substrates as conductive tracks and the resistance remained nearly the same after 10,000 bending cycles.
format Online
Article
Text
id pubmed-6723544
institution National Center for Biotechnology Information
language English
publishDate 2019
publisher MDPI
record_format MEDLINE/PubMed
spelling pubmed-67235442019-09-10 Sintering Copper Nanoparticles with Photonic Additive for Printed Conductive Patterns by Intense Pulsed Light Chung, Wan-Yu Lai, Yi-Chin Yonezawa, Tetsu Liao, Ying-Chih Nanomaterials (Basel) Article In this study, an ink formulation was developed to prepare conductive copper thin films with compact structure by using intense pulsed light (IPL) sintering. To improve inter-particle connections in the sintering process, a cuprous oxide shell was synthesized over copper nanoparticles (CuNP). This cuprous oxide shell can be reduced by IPL with the presence of a reductant and fused to form connection between large copper particles. However, the thermal yield stress after strong IPL sintering resulted in cracks of conductive copper film. Thus, a multiple pulse sintering with an off time of 2 s was needed to reach a low resistivity of 10(−5) Ω·cm. To increase the light absorption efficiency and to further decrease voids between CuNPs in the copper film, cupric oxide nanoparticles (CuONP) of 50 nm, were also added into ink. The results showed that these CuONPs can be reduced to copper with a single pulse IPL and fused with the surrounding CuNPs. With an optimal CuNP/CuONP weight ratio of 1/80, the copper film showed a lowest resistivity of 7 × 10(−5) Ω·cm, ~25% conductivity of bulk copper, with a single sintering energy at 3.08 J/cm(2). The ink can be printed on flexible substrates as conductive tracks and the resistance remained nearly the same after 10,000 bending cycles. MDPI 2019-07-25 /pmc/articles/PMC6723544/ /pubmed/31349711 http://dx.doi.org/10.3390/nano9081071 Text en © 2019 by the authors. Licensee MDPI, Basel, Switzerland. This article is an open access article distributed under the terms and conditions of the Creative Commons Attribution (CC BY) license (http://creativecommons.org/licenses/by/4.0/).
spellingShingle Article
Chung, Wan-Yu
Lai, Yi-Chin
Yonezawa, Tetsu
Liao, Ying-Chih
Sintering Copper Nanoparticles with Photonic Additive for Printed Conductive Patterns by Intense Pulsed Light
title Sintering Copper Nanoparticles with Photonic Additive for Printed Conductive Patterns by Intense Pulsed Light
title_full Sintering Copper Nanoparticles with Photonic Additive for Printed Conductive Patterns by Intense Pulsed Light
title_fullStr Sintering Copper Nanoparticles with Photonic Additive for Printed Conductive Patterns by Intense Pulsed Light
title_full_unstemmed Sintering Copper Nanoparticles with Photonic Additive for Printed Conductive Patterns by Intense Pulsed Light
title_short Sintering Copper Nanoparticles with Photonic Additive for Printed Conductive Patterns by Intense Pulsed Light
title_sort sintering copper nanoparticles with photonic additive for printed conductive patterns by intense pulsed light
topic Article
url https://www.ncbi.nlm.nih.gov/pmc/articles/PMC6723544/
https://www.ncbi.nlm.nih.gov/pubmed/31349711
http://dx.doi.org/10.3390/nano9081071
work_keys_str_mv AT chungwanyu sinteringcoppernanoparticleswithphotonicadditiveforprintedconductivepatternsbyintensepulsedlight
AT laiyichin sinteringcoppernanoparticleswithphotonicadditiveforprintedconductivepatternsbyintensepulsedlight
AT yonezawatetsu sinteringcoppernanoparticleswithphotonicadditiveforprintedconductivepatternsbyintensepulsedlight
AT liaoyingchih sinteringcoppernanoparticleswithphotonicadditiveforprintedconductivepatternsbyintensepulsedlight