Do-It-Yourself Pyramidal Mold for Nanotechnology

[Image: see text] The handcrafted fabrication of a pyramidal mold on a silicon wafer for nanopatterning was investigated. This process started with the manual delivery of an aqueous glycerol solution onto the SiO(2)/Si wafer using a micropipette and subsequent drying to form a hemisphere whose diameter is in the range of hundreds of micrometers. A coating of polystyrene (PS) onto this wafer generates a circular hole caused by dewetting. Subsequently, anisotropic wet-etching with the PS film as a mask produces a pyramidal trench, whose apex approaches hundreds of nanometers. Various elastomeric materials were casted into this pyramidal mold. A pyramidal tip mounted on a simple micropositioner was used for electrochemistry and patterning of a protein. First, an agarose hydrogel was cast with a hydrogel pen for the electrochemical reaction (HYPER). The redox reaction at the HYPER–electrode interface demonstrated the characteristics of an ultramicroelectrode or bulk electrode based on the contact area. Second, the pyramidal polydimethylsiloxane served as a polymer pen for the contact printing of silane on a glass substrate. After the successive immobilization of biotin and avidin with fluorescence labeling, the resulting fluorescence image demonstrated the successful patterning of the protein. This new process for the creation of a pyramidal mold, referred to as a “do-it-yourself” process, offers advantages to nonspecialists in nanotechnology compared to conventional lithography, specifically simplicity, rapidity, and low cost.