Effects of Annealing Temperature and Ambient on Metal/PtSe(2) Contact Alloy Formation

[Image: see text] Forming gas annealing is a common process step used to improve the performance of devices based on transition-metal dichalcogenides (TMDs). Here, the impact of forming gas anneal is investigated for PtSe(2)-based devices. A range of annealing temperatures (150, 250, and 350 °C) wer...

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Detalles Bibliográficos
Autores principales: Mirabelli, Gioele, Walsh, Lee A., Gity, Farzan, Bhattacharjee, Shubhadeep, Cullen, Conor P., Ó Coileáin, Cormac, Monaghan, Scott, McEvoy, Niall, Nagle, Roger, Hurley, Paul K., Duffy, Ray
Formato: Online Artículo Texto
Lenguaje:English
Publicado: American Chemical Society 2019
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC6812109/
https://www.ncbi.nlm.nih.gov/pubmed/31656920
http://dx.doi.org/10.1021/acsomega.9b02291

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC6812109/
https://www.ncbi.nlm.nih.gov/pubmed/31656920
http://dx.doi.org/10.1021/acsomega.9b02291

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