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Effects of Annealing Temperature and Ambient on Metal/PtSe(2) Contact Alloy Formation
[Image: see text] Forming gas annealing is a common process step used to improve the performance of devices based on transition-metal dichalcogenides (TMDs). Here, the impact of forming gas anneal is investigated for PtSe(2)-based devices. A range of annealing temperatures (150, 250, and 350 °C) wer...
Autores principales: | Mirabelli, Gioele, Walsh, Lee A., Gity, Farzan, Bhattacharjee, Shubhadeep, Cullen, Conor P., Ó Coileáin, Cormac, Monaghan, Scott, McEvoy, Niall, Nagle, Roger, Hurley, Paul K., Duffy, Ray |
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Formato: | Online Artículo Texto |
Lenguaje: | English |
Publicado: |
American Chemical Society
2019
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Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC6812109/ https://www.ncbi.nlm.nih.gov/pubmed/31656920 http://dx.doi.org/10.1021/acsomega.9b02291 |
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