Cargando…
A vertical silicon-graphene-germanium transistor
Graphene-base transistors have been proposed for high-frequency applications because of the negligible base transit time induced by the atomic thickness of graphene. However, generally used tunnel emitters suffer from high emitter potential-barrier-height which limits the transistor performance towa...
Autores principales: | Liu, Chi, Ma, Wei, Chen, Maolin, Ren, Wencai, Sun, Dongming |
---|---|
Formato: | Online Artículo Texto |
Lenguaje: | English |
Publicado: |
Nature Publishing Group UK
2019
|
Materias: | |
Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC6814790/ https://www.ncbi.nlm.nih.gov/pubmed/31653842 http://dx.doi.org/10.1038/s41467-019-12814-1 |
Ejemplares similares
-
Growth and Selective Etch of Phosphorus-Doped Silicon/Silicon–Germanium Multilayers Structures for Vertical Transistors Application
por: Li, Chen, et al.
Publicado: (2020) -
Transistor bias tables (germanium)
por: Wolfendale, Eric
Publicado: (1966) -
Germanium epitaxy on silicon
por: Ye, Hui, et al.
Publicado: (2014) -
Silicon-germanium heterojunction bipolar transistors for mm-wave systems technology, modeling and circuit applications
por: Rinaldi, Niccolò, et al.
Publicado: (2018) -
Germanium silicon: physics and materials
por: Willardson, R K, et al.
Publicado: (1998)