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Technical Note: Characterization of the new microSilicon diode detector
PURPOSE: Dosimetric properties of the new microSilicon diode detector (60023) have been studied with focus on application in small‐field dosimetry. The influences of the dimensions of the sensitive volume and the density of the epoxy layer surrounding the silicon chip of microSilicon have been quant...
Autores principales: | , , , , , , |
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Formato: | Online Artículo Texto |
Lenguaje: | English |
Publicado: |
John Wiley and Sons Inc.
2019
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Materias: | |
Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC6852691/ https://www.ncbi.nlm.nih.gov/pubmed/31309594 http://dx.doi.org/10.1002/mp.13710 |
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author | Schönfeld, Ann‐Britt Poppinga, Daniela Kranzer, Rafael De Wilde, Rudy Leon Willborn, Kay Poppe, Björn Looe, Hui Khee |
author_facet | Schönfeld, Ann‐Britt Poppinga, Daniela Kranzer, Rafael De Wilde, Rudy Leon Willborn, Kay Poppe, Björn Looe, Hui Khee |
author_sort | Schönfeld, Ann‐Britt |
collection | PubMed |
description | PURPOSE: Dosimetric properties of the new microSilicon diode detector (60023) have been studied with focus on application in small‐field dosimetry. The influences of the dimensions of the sensitive volume and the density of the epoxy layer surrounding the silicon chip of microSilicon have been quantified and compared to its predecessor (Diode E 60017) and the microDiamond (60019, all PTW‐Freiburg, Germany). METHODS: Dose linearity has been studied in the range from 0.01 to 8.55 Gy and dose‐per‐pulse dependence from 0.13 to 0.86 mGy/pulse. The effective point of measurement (EPOM) was determined by comparing measured percentage depth dose curves with a reference curve (Roos chamber). Output ratios were measured for nominal field sizes from 0.5 × 0.5 cm(2) to 4 × 4 cm(2). The corresponding small‐field output correction factors, k, were derived with a plastic scintillation detector as reference. The lateral dose–response function, K(x), was determined using a slit beam geometry. RESULTS: MicroSilicon shows linear dose response (R (2) = 1.000) in both low and high dose range up to 8.55 Gy with deviations of only up to 1% within the dose‐per‐pulse values investigated. The EPOM was found to lie (0.7 ± 0.2) mm below the front detector’s surface. The derived k for microSilicon (0.960 at s (eff) = 0.55 cm) is similar to that of microDiamond (0.956), while Diode E requires larger corrections (0.929). This improved behavior of microSilicon in small‐fields is reflected in the slightly wider K(x) compared to Diode E. Furthermore, the amplitude of the negative values in K(x) at the borders of the sensitive volume has been reduced. CONCLUSIONS: Compared to its predecessor, microSilicon shows improved dosimetric behavior with higher sensitivity and smaller dose‐per‐pulse dependence. Profile measurements demonstrated that microSilicon causes less perturbation in off‐axis measurements. It is especially suitable for the applications in small‐field output factors and profile measurements. |
format | Online Article Text |
id | pubmed-6852691 |
institution | National Center for Biotechnology Information |
language | English |
publishDate | 2019 |
publisher | John Wiley and Sons Inc. |
record_format | MEDLINE/PubMed |
spelling | pubmed-68526912019-11-21 Technical Note: Characterization of the new microSilicon diode detector Schönfeld, Ann‐Britt Poppinga, Daniela Kranzer, Rafael De Wilde, Rudy Leon Willborn, Kay Poppe, Björn Looe, Hui Khee Med Phys COMPUTATIONAL AND EXPERIMENTAL DOSIMETRY PURPOSE: Dosimetric properties of the new microSilicon diode detector (60023) have been studied with focus on application in small‐field dosimetry. The influences of the dimensions of the sensitive volume and the density of the epoxy layer surrounding the silicon chip of microSilicon have been quantified and compared to its predecessor (Diode E 60017) and the microDiamond (60019, all PTW‐Freiburg, Germany). METHODS: Dose linearity has been studied in the range from 0.01 to 8.55 Gy and dose‐per‐pulse dependence from 0.13 to 0.86 mGy/pulse. The effective point of measurement (EPOM) was determined by comparing measured percentage depth dose curves with a reference curve (Roos chamber). Output ratios were measured for nominal field sizes from 0.5 × 0.5 cm(2) to 4 × 4 cm(2). The corresponding small‐field output correction factors, k, were derived with a plastic scintillation detector as reference. The lateral dose–response function, K(x), was determined using a slit beam geometry. RESULTS: MicroSilicon shows linear dose response (R (2) = 1.000) in both low and high dose range up to 8.55 Gy with deviations of only up to 1% within the dose‐per‐pulse values investigated. The EPOM was found to lie (0.7 ± 0.2) mm below the front detector’s surface. The derived k for microSilicon (0.960 at s (eff) = 0.55 cm) is similar to that of microDiamond (0.956), while Diode E requires larger corrections (0.929). This improved behavior of microSilicon in small‐fields is reflected in the slightly wider K(x) compared to Diode E. Furthermore, the amplitude of the negative values in K(x) at the borders of the sensitive volume has been reduced. CONCLUSIONS: Compared to its predecessor, microSilicon shows improved dosimetric behavior with higher sensitivity and smaller dose‐per‐pulse dependence. Profile measurements demonstrated that microSilicon causes less perturbation in off‐axis measurements. It is especially suitable for the applications in small‐field output factors and profile measurements. John Wiley and Sons Inc. 2019-07-31 2019-09 /pmc/articles/PMC6852691/ /pubmed/31309594 http://dx.doi.org/10.1002/mp.13710 Text en © 2019 The Authors. Medical Physics published by Wiley Periodicals, Inc. on behalf of AmericanAssociation of Physicists in Medicine This is an open access article under the terms of the http://creativecommons.org/licenses/by/4.0/ License, which permits use, distribution and reproduction in any medium, provided the original work is properly cited. |
spellingShingle | COMPUTATIONAL AND EXPERIMENTAL DOSIMETRY Schönfeld, Ann‐Britt Poppinga, Daniela Kranzer, Rafael De Wilde, Rudy Leon Willborn, Kay Poppe, Björn Looe, Hui Khee Technical Note: Characterization of the new microSilicon diode detector |
title | Technical Note: Characterization of the new microSilicon diode detector |
title_full | Technical Note: Characterization of the new microSilicon diode detector |
title_fullStr | Technical Note: Characterization of the new microSilicon diode detector |
title_full_unstemmed | Technical Note: Characterization of the new microSilicon diode detector |
title_short | Technical Note: Characterization of the new microSilicon diode detector |
title_sort | technical note: characterization of the new microsilicon diode detector |
topic | COMPUTATIONAL AND EXPERIMENTAL DOSIMETRY |
url | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC6852691/ https://www.ncbi.nlm.nih.gov/pubmed/31309594 http://dx.doi.org/10.1002/mp.13710 |
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