Obliquely Deposited Titanium Nitride Nanorod Arrays as Surface-Enhanced Raman Scattering Substrates †

In this work, titanium nitride (TiN) nanorod arrays were prepared as surface-enhanced Raman scattering (SERS) substrates using glancing angle deposition (GLAD) in a magnetron sputtering system. The nitrogen flow rate was varied from R(N)(2) = 1 to 3 sccm, yielding five TiN uniform thin films and fiv...

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Detalles Bibliográficos
Autores principales: Jen, Yi-Jun, Lin, Meng-Jie, Cheang, Hou-Lon, Chan, Teh-Li
Formato: Online Artículo Texto
Lenguaje:English
Publicado: MDPI 2019
Materias:
Article
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC6866131/
https://www.ncbi.nlm.nih.gov/pubmed/31684022
http://dx.doi.org/10.3390/s19214765
Descripción
Sumario:In this work, titanium nitride (TiN) nanorod arrays were prepared as surface-enhanced Raman scattering (SERS) substrates using glancing angle deposition (GLAD) in a magnetron sputtering system. The nitrogen flow rate was varied from R(N)(2) = 1 to 3 sccm, yielding five TiN uniform thin films and five TiN nanorod arrays. The figure of merit (FOM) of each TiN uniform film was measured and compared with the SERS signal of each TiN nanorod array. Rhodamine 6G (R6G) was used as the analyte in SERS measurement. For an R6G concentration of 10(−6) M, the analytical enhancement factor (AEF) of the TiN nanorod array that was prepared at R(N)(2) = 1.5 sccm was 10(4). The time-durable SERS performance of TiN nanorod arrays was also investigated.

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