Cargando…
Light transmission and internal scattering in pulsed laser-etched partially-transparent silicon wafers
Continuing trend in silicon wafer thickness directed at cost reduction approaches basic boundaries created by: (a) mismatch between Al paste and Si wafer thermal expansion and (b) incomplete optical absorption. With its symmetrical front and back electrical contacts, the bifacial solar cell setup re...
Autores principales: | , , , , , , |
---|---|
Formato: | Online Artículo Texto |
Lenguaje: | English |
Publicado: |
Elsevier
2019
|
Materias: | |
Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC6872776/ https://www.ncbi.nlm.nih.gov/pubmed/31768436 http://dx.doi.org/10.1016/j.heliyon.2019.e02790 |
_version_ | 1783472561217077248 |
---|---|
author | Rohaizar, Muhd Hatim Sepeai, Suhaila Surhada, Nurfarizza Ludin, N.A. Ibrahim, M.A. Sopian, K. Zaidi, Saleem H. |
author_facet | Rohaizar, Muhd Hatim Sepeai, Suhaila Surhada, Nurfarizza Ludin, N.A. Ibrahim, M.A. Sopian, K. Zaidi, Saleem H. |
author_sort | Rohaizar, Muhd Hatim |
collection | PubMed |
description | Continuing trend in silicon wafer thickness directed at cost reduction approaches basic boundaries created by: (a) mismatch between Al paste and Si wafer thermal expansion and (b) incomplete optical absorption. With its symmetrical front and back electrical contacts, the bifacial solar cell setup reduces stress due to mismatch thermal expansion, decreases metal use and increases high temperature efficiency. Efficiency improvement is accomplished in bifacial solar cells by capturing light from the back surface. Partially transparent wafers provide an option to improve near-infrared radiation absorption within Si wafer. To fully absorb optical radiation, three-dimensional texture of these kinds of wafers is essential. Pulsed laser interactions, thermal oxidation, and wet chemical etching are included in this research. A feature of its energy and pattern setup is the interaction of pulsed laser with Si, running at 1.064 μm wavelength and micro-second length. Two experimental settings were explored: (a) post-laser chemical etching with potassium hydro-oxide etching with thermal oxide as etching mask and (b) post-laser heat Si surface oxidation. Due to fast melting and recrystallization, laser pulsed processing inherently produces its own texture. Some of these spherically-shaped, randomly focused characteristics improve inner scattering and boost near-infrared absorption within the wafer. These characteristics are separated during chemical etching with the thermally-grown oxide layer as an etch mask. Comparison of optical absorption in both surfaces shows almost a rise in the magnitude of absorption in non-etched surfaces. Detailed optical (optical microscope and IR absorption), morphological (field emission scanning electron microscope) and heat imaging (far IR camera) analyses were performed to comprehend physical processes that contribute to near-IR absorption improvement. Such kinds of partially-transparent, three-dimensional textured Si wafers are anticipated to discover applications for bifacial solar cells as substrates. |
format | Online Article Text |
id | pubmed-6872776 |
institution | National Center for Biotechnology Information |
language | English |
publishDate | 2019 |
publisher | Elsevier |
record_format | MEDLINE/PubMed |
spelling | pubmed-68727762019-11-25 Light transmission and internal scattering in pulsed laser-etched partially-transparent silicon wafers Rohaizar, Muhd Hatim Sepeai, Suhaila Surhada, Nurfarizza Ludin, N.A. Ibrahim, M.A. Sopian, K. Zaidi, Saleem H. Heliyon Article Continuing trend in silicon wafer thickness directed at cost reduction approaches basic boundaries created by: (a) mismatch between Al paste and Si wafer thermal expansion and (b) incomplete optical absorption. With its symmetrical front and back electrical contacts, the bifacial solar cell setup reduces stress due to mismatch thermal expansion, decreases metal use and increases high temperature efficiency. Efficiency improvement is accomplished in bifacial solar cells by capturing light from the back surface. Partially transparent wafers provide an option to improve near-infrared radiation absorption within Si wafer. To fully absorb optical radiation, three-dimensional texture of these kinds of wafers is essential. Pulsed laser interactions, thermal oxidation, and wet chemical etching are included in this research. A feature of its energy and pattern setup is the interaction of pulsed laser with Si, running at 1.064 μm wavelength and micro-second length. Two experimental settings were explored: (a) post-laser chemical etching with potassium hydro-oxide etching with thermal oxide as etching mask and (b) post-laser heat Si surface oxidation. Due to fast melting and recrystallization, laser pulsed processing inherently produces its own texture. Some of these spherically-shaped, randomly focused characteristics improve inner scattering and boost near-infrared absorption within the wafer. These characteristics are separated during chemical etching with the thermally-grown oxide layer as an etch mask. Comparison of optical absorption in both surfaces shows almost a rise in the magnitude of absorption in non-etched surfaces. Detailed optical (optical microscope and IR absorption), morphological (field emission scanning electron microscope) and heat imaging (far IR camera) analyses were performed to comprehend physical processes that contribute to near-IR absorption improvement. Such kinds of partially-transparent, three-dimensional textured Si wafers are anticipated to discover applications for bifacial solar cells as substrates. Elsevier 2019-11-20 /pmc/articles/PMC6872776/ /pubmed/31768436 http://dx.doi.org/10.1016/j.heliyon.2019.e02790 Text en © 2019 The Authors http://creativecommons.org/licenses/by-nc-nd/4.0/ This is an open access article under the CC BY-NC-ND license (http://creativecommons.org/licenses/by-nc-nd/4.0/). |
spellingShingle | Article Rohaizar, Muhd Hatim Sepeai, Suhaila Surhada, Nurfarizza Ludin, N.A. Ibrahim, M.A. Sopian, K. Zaidi, Saleem H. Light transmission and internal scattering in pulsed laser-etched partially-transparent silicon wafers |
title | Light transmission and internal scattering in pulsed laser-etched partially-transparent silicon wafers |
title_full | Light transmission and internal scattering in pulsed laser-etched partially-transparent silicon wafers |
title_fullStr | Light transmission and internal scattering in pulsed laser-etched partially-transparent silicon wafers |
title_full_unstemmed | Light transmission and internal scattering in pulsed laser-etched partially-transparent silicon wafers |
title_short | Light transmission and internal scattering in pulsed laser-etched partially-transparent silicon wafers |
title_sort | light transmission and internal scattering in pulsed laser-etched partially-transparent silicon wafers |
topic | Article |
url | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC6872776/ https://www.ncbi.nlm.nih.gov/pubmed/31768436 http://dx.doi.org/10.1016/j.heliyon.2019.e02790 |
work_keys_str_mv | AT rohaizarmuhdhatim lighttransmissionandinternalscatteringinpulsedlaseretchedpartiallytransparentsiliconwafers AT sepeaisuhaila lighttransmissionandinternalscatteringinpulsedlaseretchedpartiallytransparentsiliconwafers AT surhadanurfarizza lighttransmissionandinternalscatteringinpulsedlaseretchedpartiallytransparentsiliconwafers AT ludinna lighttransmissionandinternalscatteringinpulsedlaseretchedpartiallytransparentsiliconwafers AT ibrahimma lighttransmissionandinternalscatteringinpulsedlaseretchedpartiallytransparentsiliconwafers AT sopiank lighttransmissionandinternalscatteringinpulsedlaseretchedpartiallytransparentsiliconwafers AT zaidisaleemh lighttransmissionandinternalscatteringinpulsedlaseretchedpartiallytransparentsiliconwafers |