Cargando…
Stability under humidity, UV-light and bending of AZO films deposited by ALD on Kapton
Aluminium doped zinc oxide (AZO) films were grown by Atomic Layer Deposition (ALD) on yellow Kapton and transparent Kapton (type CS) substrates for large area flexible transparent thermoelectric applications, which performance relies on the thermoelectric properties of the transparent AZO films. The...
Autores principales: | , , , , , , , |
---|---|
Formato: | Online Artículo Texto |
Lenguaje: | English |
Publicado: |
Nature Publishing Group UK
2019
|
Materias: | |
Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC6884584/ https://www.ncbi.nlm.nih.gov/pubmed/31784687 http://dx.doi.org/10.1038/s41598-019-54451-0 |
_version_ | 1783474580913913856 |
---|---|
author | Marques, A. C. Faria, J. Perdigão, P. Faustino, B. M. M. Ritasalo, Riina Costabello, Katiuscia da Silva, R. C. Ferreira, I. |
author_facet | Marques, A. C. Faria, J. Perdigão, P. Faustino, B. M. M. Ritasalo, Riina Costabello, Katiuscia da Silva, R. C. Ferreira, I. |
author_sort | Marques, A. C. |
collection | PubMed |
description | Aluminium doped zinc oxide (AZO) films were grown by Atomic Layer Deposition (ALD) on yellow Kapton and transparent Kapton (type CS) substrates for large area flexible transparent thermoelectric applications, which performance relies on the thermoelectric properties of the transparent AZO films. Therefore, their adhesion to Kapton, environmental and bending stability were accessed. Plasma treatment on Kapton substrates improved films adhesion, reduced cracks formation, and enhanced electrical resistance stability over time, of importance for long term thermoelectric applications in external environment. While exposure to UV light intensity caused the films electrical resistance to vary, and therefore their maximum power density outputs (0.3–0.4 mW/cm(3)) for a constant temperature difference (∼10 °C), humidity exposure and consecutive bending up to a curvature radius above the critical one (∼18 mm) not. Testing whether the films can benefit from encapsulation revealed that this can provide extra bending stability and prevent contacts deterioration in the long term. |
format | Online Article Text |
id | pubmed-6884584 |
institution | National Center for Biotechnology Information |
language | English |
publishDate | 2019 |
publisher | Nature Publishing Group UK |
record_format | MEDLINE/PubMed |
spelling | pubmed-68845842019-12-06 Stability under humidity, UV-light and bending of AZO films deposited by ALD on Kapton Marques, A. C. Faria, J. Perdigão, P. Faustino, B. M. M. Ritasalo, Riina Costabello, Katiuscia da Silva, R. C. Ferreira, I. Sci Rep Article Aluminium doped zinc oxide (AZO) films were grown by Atomic Layer Deposition (ALD) on yellow Kapton and transparent Kapton (type CS) substrates for large area flexible transparent thermoelectric applications, which performance relies on the thermoelectric properties of the transparent AZO films. Therefore, their adhesion to Kapton, environmental and bending stability were accessed. Plasma treatment on Kapton substrates improved films adhesion, reduced cracks formation, and enhanced electrical resistance stability over time, of importance for long term thermoelectric applications in external environment. While exposure to UV light intensity caused the films electrical resistance to vary, and therefore their maximum power density outputs (0.3–0.4 mW/cm(3)) for a constant temperature difference (∼10 °C), humidity exposure and consecutive bending up to a curvature radius above the critical one (∼18 mm) not. Testing whether the films can benefit from encapsulation revealed that this can provide extra bending stability and prevent contacts deterioration in the long term. Nature Publishing Group UK 2019-11-29 /pmc/articles/PMC6884584/ /pubmed/31784687 http://dx.doi.org/10.1038/s41598-019-54451-0 Text en © The Author(s) 2019 Open Access This article is licensed under a Creative Commons Attribution 4.0 International License, which permits use, sharing, adaptation, distribution and reproduction in any medium or format, as long as you give appropriate credit to the original author(s) and the source, provide a link to the Creative Commons license, and indicate if changes were made. The images or other third party material in this article are included in the article’s Creative Commons license, unless indicated otherwise in a credit line to the material. If material is not included in the article’s Creative Commons license and your intended use is not permitted by statutory regulation or exceeds the permitted use, you will need to obtain permission directly from the copyright holder. To view a copy of this license, visit http://creativecommons.org/licenses/by/4.0/. |
spellingShingle | Article Marques, A. C. Faria, J. Perdigão, P. Faustino, B. M. M. Ritasalo, Riina Costabello, Katiuscia da Silva, R. C. Ferreira, I. Stability under humidity, UV-light and bending of AZO films deposited by ALD on Kapton |
title | Stability under humidity, UV-light and bending of AZO films deposited by ALD on Kapton |
title_full | Stability under humidity, UV-light and bending of AZO films deposited by ALD on Kapton |
title_fullStr | Stability under humidity, UV-light and bending of AZO films deposited by ALD on Kapton |
title_full_unstemmed | Stability under humidity, UV-light and bending of AZO films deposited by ALD on Kapton |
title_short | Stability under humidity, UV-light and bending of AZO films deposited by ALD on Kapton |
title_sort | stability under humidity, uv-light and bending of azo films deposited by ald on kapton |
topic | Article |
url | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC6884584/ https://www.ncbi.nlm.nih.gov/pubmed/31784687 http://dx.doi.org/10.1038/s41598-019-54451-0 |
work_keys_str_mv | AT marquesac stabilityunderhumidityuvlightandbendingofazofilmsdepositedbyaldonkapton AT fariaj stabilityunderhumidityuvlightandbendingofazofilmsdepositedbyaldonkapton AT perdigaop stabilityunderhumidityuvlightandbendingofazofilmsdepositedbyaldonkapton AT faustinobmm stabilityunderhumidityuvlightandbendingofazofilmsdepositedbyaldonkapton AT ritasaloriina stabilityunderhumidityuvlightandbendingofazofilmsdepositedbyaldonkapton AT costabellokatiuscia stabilityunderhumidityuvlightandbendingofazofilmsdepositedbyaldonkapton AT dasilvarc stabilityunderhumidityuvlightandbendingofazofilmsdepositedbyaldonkapton AT ferreirai stabilityunderhumidityuvlightandbendingofazofilmsdepositedbyaldonkapton |