Cargando…
Radio Frequency Plasma-Enhanced Reactive Magnetron Sputtering Deposition of α-SiN(x) on Photonic Crystal—Laser Diodes for Facet Passivation
[Image: see text] Amorphous silicon nitride (α-SiN(x)) films were coated on a photonic crystal-laser diode by the radio frequency magnetron sputtering method. Sputtering deposition conditions were changed to obtain α-SiN(x) films with different properties. The optical parameters and morphologies of...
| Autores principales: | , , , , , |
|---|---|
| Formato: | Online Artículo Texto |
| Lenguaje: | English |
| Publicado: |
American Chemical
Society
2019
|
| Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC6893945/ https://www.ncbi.nlm.nih.gov/pubmed/31815221 http://dx.doi.org/10.1021/acsomega.9b02452 |