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Measuring energy-dependent photoelectron escape in microcrystals
With the increasing trend of using microcrystals and intense microbeams at synchrotron X-ray beamlines, radiation damage becomes a more pressing problem. Theoretical calculations show that the photoelectrons that primarily cause damage can escape microcrystals. This effect would become more pronounc...
Autores principales: | , , , , , , |
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Formato: | Online Artículo Texto |
Lenguaje: | English |
Publicado: |
International Union of Crystallography
2020
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Materias: | |
Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC6949606/ https://www.ncbi.nlm.nih.gov/pubmed/31949913 http://dx.doi.org/10.1107/S2052252519016178 |
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author | Storm, Selina L. S. Crawshaw, Adam D. Devenish, Nicholas E. Bolton, Rachel Hall, David R. Tews, Ivo Evans, Gwyndaf |
author_facet | Storm, Selina L. S. Crawshaw, Adam D. Devenish, Nicholas E. Bolton, Rachel Hall, David R. Tews, Ivo Evans, Gwyndaf |
author_sort | Storm, Selina L. S. |
collection | PubMed |
description | With the increasing trend of using microcrystals and intense microbeams at synchrotron X-ray beamlines, radiation damage becomes a more pressing problem. Theoretical calculations show that the photoelectrons that primarily cause damage can escape microcrystals. This effect would become more pronounced with decreasing crystal size as well as at higher energies. To prove this effect, data from cryocooled lysozyme crystals of dimensions 5 × 3 × 3 and 20 × 8 × 8 µm mounted on cryo-transmission electron microscopy (cryo-TEM) grids were collected at 13.5 and 20.1 keV using a PILATUS CdTe 2M detector, which has a similar quantum efficiency at both energies. Accurate absorbed doses were calculated through the direct measurement of individual crystal sizes using scanning electron microscopy after the experiment and characterization of the X-ray microbeam. The crystal lifetime was then quantified based on the D (1/2) metric. In this first systematic study, a longer crystal lifetime for smaller crystals was observed and crystal lifetime increased at higher X-ray energies, supporting the theoretical predictions of photoelectron escape. The use of detector technologies specifically optimized for data collection at energies above 20 keV allows the theoretically predicted photoelectron escape to be quantified and exploited, guiding future beamline-design choices. |
format | Online Article Text |
id | pubmed-6949606 |
institution | National Center for Biotechnology Information |
language | English |
publishDate | 2020 |
publisher | International Union of Crystallography |
record_format | MEDLINE/PubMed |
spelling | pubmed-69496062020-01-16 Measuring energy-dependent photoelectron escape in microcrystals Storm, Selina L. S. Crawshaw, Adam D. Devenish, Nicholas E. Bolton, Rachel Hall, David R. Tews, Ivo Evans, Gwyndaf IUCrJ Research Papers With the increasing trend of using microcrystals and intense microbeams at synchrotron X-ray beamlines, radiation damage becomes a more pressing problem. Theoretical calculations show that the photoelectrons that primarily cause damage can escape microcrystals. This effect would become more pronounced with decreasing crystal size as well as at higher energies. To prove this effect, data from cryocooled lysozyme crystals of dimensions 5 × 3 × 3 and 20 × 8 × 8 µm mounted on cryo-transmission electron microscopy (cryo-TEM) grids were collected at 13.5 and 20.1 keV using a PILATUS CdTe 2M detector, which has a similar quantum efficiency at both energies. Accurate absorbed doses were calculated through the direct measurement of individual crystal sizes using scanning electron microscopy after the experiment and characterization of the X-ray microbeam. The crystal lifetime was then quantified based on the D (1/2) metric. In this first systematic study, a longer crystal lifetime for smaller crystals was observed and crystal lifetime increased at higher X-ray energies, supporting the theoretical predictions of photoelectron escape. The use of detector technologies specifically optimized for data collection at energies above 20 keV allows the theoretically predicted photoelectron escape to be quantified and exploited, guiding future beamline-design choices. International Union of Crystallography 2020-01-01 /pmc/articles/PMC6949606/ /pubmed/31949913 http://dx.doi.org/10.1107/S2052252519016178 Text en © Selina L. S. Storm et al. 2020 http://creativecommons.org/licenses/by/4.0/ This is an open-access article distributed under the terms of the Creative Commons Attribution (CC-BY) Licence, which permits unrestricted use, distribution, and reproduction in any medium, provided the original authors and source are cited.http://creativecommons.org/licenses/by/4.0/ |
spellingShingle | Research Papers Storm, Selina L. S. Crawshaw, Adam D. Devenish, Nicholas E. Bolton, Rachel Hall, David R. Tews, Ivo Evans, Gwyndaf Measuring energy-dependent photoelectron escape in microcrystals |
title | Measuring energy-dependent photoelectron escape in microcrystals |
title_full | Measuring energy-dependent photoelectron escape in microcrystals |
title_fullStr | Measuring energy-dependent photoelectron escape in microcrystals |
title_full_unstemmed | Measuring energy-dependent photoelectron escape in microcrystals |
title_short | Measuring energy-dependent photoelectron escape in microcrystals |
title_sort | measuring energy-dependent photoelectron escape in microcrystals |
topic | Research Papers |
url | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC6949606/ https://www.ncbi.nlm.nih.gov/pubmed/31949913 http://dx.doi.org/10.1107/S2052252519016178 |
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