Electrochemical Deposition of Silicon-Carbon Films: A Study on the Nucleation and Growth Mechanism

Silicon-carbon films have been deposited on silicon and Al(2)O(3)/Cr-Cu substrates, making use of the electrolysis of methanol/dimethylformamide-hexamethyldisilazane (HMDS) solutions. The electrodeposited films were characterized by Raman spectroscopy and scanning electron microscopy, respectively....

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Detalles Bibliográficos
Autores principales: Plugotarenko, Nina K., Myasoedova, Tatiana N., Grigoryev, Mikhail N., Mikhailova, Tatiana S.
Formato: Online Artículo Texto
Lenguaje:English
Publicado: MDPI 2019
Materias:
Article
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC6955895/
https://www.ncbi.nlm.nih.gov/pubmed/31835483
http://dx.doi.org/10.3390/nano9121754
Descripción
Sumario:Silicon-carbon films have been deposited on silicon and Al(2)O(3)/Cr-Cu substrates, making use of the electrolysis of methanol/dimethylformamide-hexamethyldisilazane (HMDS) solutions. The electrodeposited films were characterized by Raman spectroscopy and scanning electron microscopy, respectively. Moreover, the nucleation and growth mechanism of the films were studied from the experimental current transients.

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