Electrochemical Deposition of Silicon-Carbon Films: A Study on the Nucleation and Growth Mechanism

Silicon-carbon films have been deposited on silicon and Al(2)O(3)/Cr-Cu substrates, making use of the electrolysis of methanol/dimethylformamide-hexamethyldisilazane (HMDS) solutions. The electrodeposited films were characterized by Raman spectroscopy and scanning electron microscopy, respectively....

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Autores principales: Plugotarenko, Nina K., Myasoedova, Tatiana N., Grigoryev, Mikhail N., Mikhailova, Tatiana S.
Formato: Online Artículo Texto
Lenguaje:English
Publicado: MDPI 2019
Materias:
Article
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC6955895/
https://www.ncbi.nlm.nih.gov/pubmed/31835483
http://dx.doi.org/10.3390/nano9121754
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author Plugotarenko, Nina K.
Myasoedova, Tatiana N.
Grigoryev, Mikhail N.
Mikhailova, Tatiana S.
author_facet Plugotarenko, Nina K.
Myasoedova, Tatiana N.
Grigoryev, Mikhail N.
Mikhailova, Tatiana S.
author_sort Plugotarenko, Nina K.
collection PubMed
description Silicon-carbon films have been deposited on silicon and Al(2)O(3)/Cr-Cu substrates, making use of the electrolysis of methanol/dimethylformamide-hexamethyldisilazane (HMDS) solutions. The electrodeposited films were characterized by Raman spectroscopy and scanning electron microscopy, respectively. Moreover, the nucleation and growth mechanism of the films were studied from the experimental current transients.
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spelling pubmed-69558952020-01-23 Electrochemical Deposition of Silicon-Carbon Films: A Study on the Nucleation and Growth Mechanism Plugotarenko, Nina K. Myasoedova, Tatiana N. Grigoryev, Mikhail N. Mikhailova, Tatiana S. Nanomaterials (Basel) Article Silicon-carbon films have been deposited on silicon and Al(2)O(3)/Cr-Cu substrates, making use of the electrolysis of methanol/dimethylformamide-hexamethyldisilazane (HMDS) solutions. The electrodeposited films were characterized by Raman spectroscopy and scanning electron microscopy, respectively. Moreover, the nucleation and growth mechanism of the films were studied from the experimental current transients. MDPI 2019-12-10 /pmc/articles/PMC6955895/ /pubmed/31835483 http://dx.doi.org/10.3390/nano9121754 Text en © 2019 by the authors. Licensee MDPI, Basel, Switzerland. This article is an open access article distributed under the terms and conditions of the Creative Commons Attribution (CC BY) license (http://creativecommons.org/licenses/by/4.0/).
spellingShingle Article
Plugotarenko, Nina K.
Myasoedova, Tatiana N.
Grigoryev, Mikhail N.
Mikhailova, Tatiana S.
Electrochemical Deposition of Silicon-Carbon Films: A Study on the Nucleation and Growth Mechanism
title Electrochemical Deposition of Silicon-Carbon Films: A Study on the Nucleation and Growth Mechanism
title_full Electrochemical Deposition of Silicon-Carbon Films: A Study on the Nucleation and Growth Mechanism
title_fullStr Electrochemical Deposition of Silicon-Carbon Films: A Study on the Nucleation and Growth Mechanism
title_full_unstemmed Electrochemical Deposition of Silicon-Carbon Films: A Study on the Nucleation and Growth Mechanism
title_short Electrochemical Deposition of Silicon-Carbon Films: A Study on the Nucleation and Growth Mechanism
title_sort electrochemical deposition of silicon-carbon films: a study on the nucleation and growth mechanism
topic Article
url https://www.ncbi.nlm.nih.gov/pmc/articles/PMC6955895/
https://www.ncbi.nlm.nih.gov/pubmed/31835483
http://dx.doi.org/10.3390/nano9121754
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AT grigoryevmikhailn electrochemicaldepositionofsiliconcarbonfilmsastudyonthenucleationandgrowthmechanism
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