Electrochemical Deposition of Silicon-Carbon Films: A Study on the Nucleation and Growth Mechanism

Silicon-carbon films have been deposited on silicon and Al(2)O(3)/Cr-Cu substrates, making use of the electrolysis of methanol/dimethylformamide-hexamethyldisilazane (HMDS) solutions. The electrodeposited films were characterized by Raman spectroscopy and scanning electron microscopy, respectively....

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Detalles Bibliográficos
Autores principales: Plugotarenko, Nina K., Myasoedova, Tatiana N., Grigoryev, Mikhail N., Mikhailova, Tatiana S.
Formato: Online Artículo Texto
Lenguaje:English
Publicado: MDPI 2019
Materias:
Article
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC6955895/
https://www.ncbi.nlm.nih.gov/pubmed/31835483
http://dx.doi.org/10.3390/nano9121754

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC6955895/
https://www.ncbi.nlm.nih.gov/pubmed/31835483
http://dx.doi.org/10.3390/nano9121754

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