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Fabrication and Characterization of a Metallic–Dielectric Nanorod Array by Nanosphere Lithography for Plasmonic Sensing Application

In this paper, a periodic metallic–dielectric nanorod array which consists of Si nanorods coated with 30 nm Ag thin film set in a hexagonal configuration is fabricated and characterized. The fabrication procedure is performed by using nanosphere lithography with reactive ion etching, followed by Ag...

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Autores principales: Chou Chau, Yuan-Fong, Chen, Kuan-Hung, Chiang, Hai-Pang, Lim, Chee Ming, Huang, Hung Ji, Lai, Chih-Hsien, Kumara, N. T. R. N.
Formato: Online Artículo Texto
Lenguaje:English
Publicado: MDPI 2019
Materias:
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC6956078/
https://www.ncbi.nlm.nih.gov/pubmed/31779222
http://dx.doi.org/10.3390/nano9121691
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author Chou Chau, Yuan-Fong
Chen, Kuan-Hung
Chiang, Hai-Pang
Lim, Chee Ming
Huang, Hung Ji
Lai, Chih-Hsien
Kumara, N. T. R. N.
author_facet Chou Chau, Yuan-Fong
Chen, Kuan-Hung
Chiang, Hai-Pang
Lim, Chee Ming
Huang, Hung Ji
Lai, Chih-Hsien
Kumara, N. T. R. N.
author_sort Chou Chau, Yuan-Fong
collection PubMed
description In this paper, a periodic metallic–dielectric nanorod array which consists of Si nanorods coated with 30 nm Ag thin film set in a hexagonal configuration is fabricated and characterized. The fabrication procedure is performed by using nanosphere lithography with reactive ion etching, followed by Ag thin-film deposition. The mechanism of the surface and gap plasmon modes supported by the fabricated structure is numerically demonstrated by the three-dimensional finite element method. The measured and simulated absorptance spectra are observed to have a same trend and a qualitative fit. Our fabricated plasmonic sensor shows an average sensitivity of 340.0 nm/RIU when applied to a refractive index sensor ranging from 1.0 to 1.6. The proposed substrates provide a practical plasmonic nanorod-based sensing platform, and the fabrication methods used are technically effective and low-cost.
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spelling pubmed-69560782020-01-23 Fabrication and Characterization of a Metallic–Dielectric Nanorod Array by Nanosphere Lithography for Plasmonic Sensing Application Chou Chau, Yuan-Fong Chen, Kuan-Hung Chiang, Hai-Pang Lim, Chee Ming Huang, Hung Ji Lai, Chih-Hsien Kumara, N. T. R. N. Nanomaterials (Basel) Article In this paper, a periodic metallic–dielectric nanorod array which consists of Si nanorods coated with 30 nm Ag thin film set in a hexagonal configuration is fabricated and characterized. The fabrication procedure is performed by using nanosphere lithography with reactive ion etching, followed by Ag thin-film deposition. The mechanism of the surface and gap plasmon modes supported by the fabricated structure is numerically demonstrated by the three-dimensional finite element method. The measured and simulated absorptance spectra are observed to have a same trend and a qualitative fit. Our fabricated plasmonic sensor shows an average sensitivity of 340.0 nm/RIU when applied to a refractive index sensor ranging from 1.0 to 1.6. The proposed substrates provide a practical plasmonic nanorod-based sensing platform, and the fabrication methods used are technically effective and low-cost. MDPI 2019-11-26 /pmc/articles/PMC6956078/ /pubmed/31779222 http://dx.doi.org/10.3390/nano9121691 Text en © 2019 by the authors. Licensee MDPI, Basel, Switzerland. This article is an open access article distributed under the terms and conditions of the Creative Commons Attribution (CC BY) license (http://creativecommons.org/licenses/by/4.0/).
spellingShingle Article
Chou Chau, Yuan-Fong
Chen, Kuan-Hung
Chiang, Hai-Pang
Lim, Chee Ming
Huang, Hung Ji
Lai, Chih-Hsien
Kumara, N. T. R. N.
Fabrication and Characterization of a Metallic–Dielectric Nanorod Array by Nanosphere Lithography for Plasmonic Sensing Application
title Fabrication and Characterization of a Metallic–Dielectric Nanorod Array by Nanosphere Lithography for Plasmonic Sensing Application
title_full Fabrication and Characterization of a Metallic–Dielectric Nanorod Array by Nanosphere Lithography for Plasmonic Sensing Application
title_fullStr Fabrication and Characterization of a Metallic–Dielectric Nanorod Array by Nanosphere Lithography for Plasmonic Sensing Application
title_full_unstemmed Fabrication and Characterization of a Metallic–Dielectric Nanorod Array by Nanosphere Lithography for Plasmonic Sensing Application
title_short Fabrication and Characterization of a Metallic–Dielectric Nanorod Array by Nanosphere Lithography for Plasmonic Sensing Application
title_sort fabrication and characterization of a metallic–dielectric nanorod array by nanosphere lithography for plasmonic sensing application
topic Article
url https://www.ncbi.nlm.nih.gov/pmc/articles/PMC6956078/
https://www.ncbi.nlm.nih.gov/pubmed/31779222
http://dx.doi.org/10.3390/nano9121691
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