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Development of an Analytical Model for Optimization of Direct Laser Interference Patterning

Direct laser interference patterning (DLIP) has proven to be a fast and, at the same time, high-resolution process for the fabrication of large-area surface structures. In order to provide structures with adequate quality and defined morphology at the fastest possible fabrication speed, the processi...

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Autores principales: Voisiat, Bogdan, Aguilar-Morales, Alfredo I., Kunze, Tim, Lasagni, Andrés Fabián
Formato: Online Artículo Texto
Lenguaje:English
Publicado: MDPI 2020
Materias:
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC6981956/
https://www.ncbi.nlm.nih.gov/pubmed/31947726
http://dx.doi.org/10.3390/ma13010200
_version_ 1783491203104243712
author Voisiat, Bogdan
Aguilar-Morales, Alfredo I.
Kunze, Tim
Lasagni, Andrés Fabián
author_facet Voisiat, Bogdan
Aguilar-Morales, Alfredo I.
Kunze, Tim
Lasagni, Andrés Fabián
author_sort Voisiat, Bogdan
collection PubMed
description Direct laser interference patterning (DLIP) has proven to be a fast and, at the same time, high-resolution process for the fabrication of large-area surface structures. In order to provide structures with adequate quality and defined morphology at the fastest possible fabrication speed, the processing parameters have to be carefully selected. In this work, an analytical model was developed and verified by experimental data, which allows calculating the morphological properties of periodic structures as a function of most relevant laser-processing parameters. The developed model permits to improve the process throughput by optimizing the laser spot diameter, as well as pulse energy, and repetition rate. The model was developed for the structures formed by a single scan of the beam in one direction. To validate the model, microstructures with a 5.5 µm spatial period were fabricated on stainless steel by means of picosecond DLIP (10 ps), using a laser source operating at a 1064 nm wavelength. The results showed a difference of only 10% compared to the experimental results.
format Online
Article
Text
id pubmed-6981956
institution National Center for Biotechnology Information
language English
publishDate 2020
publisher MDPI
record_format MEDLINE/PubMed
spelling pubmed-69819562020-02-07 Development of an Analytical Model for Optimization of Direct Laser Interference Patterning Voisiat, Bogdan Aguilar-Morales, Alfredo I. Kunze, Tim Lasagni, Andrés Fabián Materials (Basel) Article Direct laser interference patterning (DLIP) has proven to be a fast and, at the same time, high-resolution process for the fabrication of large-area surface structures. In order to provide structures with adequate quality and defined morphology at the fastest possible fabrication speed, the processing parameters have to be carefully selected. In this work, an analytical model was developed and verified by experimental data, which allows calculating the morphological properties of periodic structures as a function of most relevant laser-processing parameters. The developed model permits to improve the process throughput by optimizing the laser spot diameter, as well as pulse energy, and repetition rate. The model was developed for the structures formed by a single scan of the beam in one direction. To validate the model, microstructures with a 5.5 µm spatial period were fabricated on stainless steel by means of picosecond DLIP (10 ps), using a laser source operating at a 1064 nm wavelength. The results showed a difference of only 10% compared to the experimental results. MDPI 2020-01-03 /pmc/articles/PMC6981956/ /pubmed/31947726 http://dx.doi.org/10.3390/ma13010200 Text en © 2020 by the authors. Licensee MDPI, Basel, Switzerland. This article is an open access article distributed under the terms and conditions of the Creative Commons Attribution (CC BY) license (http://creativecommons.org/licenses/by/4.0/).
spellingShingle Article
Voisiat, Bogdan
Aguilar-Morales, Alfredo I.
Kunze, Tim
Lasagni, Andrés Fabián
Development of an Analytical Model for Optimization of Direct Laser Interference Patterning
title Development of an Analytical Model for Optimization of Direct Laser Interference Patterning
title_full Development of an Analytical Model for Optimization of Direct Laser Interference Patterning
title_fullStr Development of an Analytical Model for Optimization of Direct Laser Interference Patterning
title_full_unstemmed Development of an Analytical Model for Optimization of Direct Laser Interference Patterning
title_short Development of an Analytical Model for Optimization of Direct Laser Interference Patterning
title_sort development of an analytical model for optimization of direct laser interference patterning
topic Article
url https://www.ncbi.nlm.nih.gov/pmc/articles/PMC6981956/
https://www.ncbi.nlm.nih.gov/pubmed/31947726
http://dx.doi.org/10.3390/ma13010200
work_keys_str_mv AT voisiatbogdan developmentofananalyticalmodelforoptimizationofdirectlaserinterferencepatterning
AT aguilarmoralesalfredoi developmentofananalyticalmodelforoptimizationofdirectlaserinterferencepatterning
AT kunzetim developmentofananalyticalmodelforoptimizationofdirectlaserinterferencepatterning
AT lasagniandresfabian developmentofananalyticalmodelforoptimizationofdirectlaserinterferencepatterning