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Substrate induced nanoscale resistance variation in epitaxial graphene
Graphene, the first true two-dimensional material, still reveals the most remarkable transport properties among the growing class of two-dimensional materials. Although many studies have investigated fundamental scattering processes, the surprisingly large variation in the experimentally determined...
Autores principales: | , , , , , , , , , , |
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Formato: | Online Artículo Texto |
Lenguaje: | English |
Publicado: |
Nature Publishing Group UK
2020
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Materias: | |
Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC6987157/ https://www.ncbi.nlm.nih.gov/pubmed/31992696 http://dx.doi.org/10.1038/s41467-019-14192-0 |
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author | Sinterhauf, Anna Traeger, Georg A. Momeni Pakdehi, Davood Schädlich, Philip Willke, Philip Speck, Florian Seyller, Thomas Tegenkamp, Christoph Pierz, Klaus Schumacher, Hans Werner Wenderoth, Martin |
author_facet | Sinterhauf, Anna Traeger, Georg A. Momeni Pakdehi, Davood Schädlich, Philip Willke, Philip Speck, Florian Seyller, Thomas Tegenkamp, Christoph Pierz, Klaus Schumacher, Hans Werner Wenderoth, Martin |
author_sort | Sinterhauf, Anna |
collection | PubMed |
description | Graphene, the first true two-dimensional material, still reveals the most remarkable transport properties among the growing class of two-dimensional materials. Although many studies have investigated fundamental scattering processes, the surprisingly large variation in the experimentally determined resistances is still an open issue. Here, we quantitatively investigate local transport properties of graphene prepared by polymer assisted sublimation growth using scanning tunneling potentiometry. These samples exhibit a spatially homogeneous current density, which allows to analyze variations in the local electrochemical potential with high precision. We utilize this possibility by examining the local sheet resistance finding a significant variation of up to 270% at low temperatures. We identify a correlation of the sheet resistance with the stacking sequence of the 6H silicon carbide substrate and with the distance between the graphene and the substrate. Our results experimentally quantify the impact of the graphene-substrate interaction on the local transport properties of graphene. |
format | Online Article Text |
id | pubmed-6987157 |
institution | National Center for Biotechnology Information |
language | English |
publishDate | 2020 |
publisher | Nature Publishing Group UK |
record_format | MEDLINE/PubMed |
spelling | pubmed-69871572020-01-30 Substrate induced nanoscale resistance variation in epitaxial graphene Sinterhauf, Anna Traeger, Georg A. Momeni Pakdehi, Davood Schädlich, Philip Willke, Philip Speck, Florian Seyller, Thomas Tegenkamp, Christoph Pierz, Klaus Schumacher, Hans Werner Wenderoth, Martin Nat Commun Article Graphene, the first true two-dimensional material, still reveals the most remarkable transport properties among the growing class of two-dimensional materials. Although many studies have investigated fundamental scattering processes, the surprisingly large variation in the experimentally determined resistances is still an open issue. Here, we quantitatively investigate local transport properties of graphene prepared by polymer assisted sublimation growth using scanning tunneling potentiometry. These samples exhibit a spatially homogeneous current density, which allows to analyze variations in the local electrochemical potential with high precision. We utilize this possibility by examining the local sheet resistance finding a significant variation of up to 270% at low temperatures. We identify a correlation of the sheet resistance with the stacking sequence of the 6H silicon carbide substrate and with the distance between the graphene and the substrate. Our results experimentally quantify the impact of the graphene-substrate interaction on the local transport properties of graphene. Nature Publishing Group UK 2020-01-28 /pmc/articles/PMC6987157/ /pubmed/31992696 http://dx.doi.org/10.1038/s41467-019-14192-0 Text en © The Author(s) 2020 Open Access This article is licensed under a Creative Commons Attribution 4.0 International License, which permits use, sharing, adaptation, distribution and reproduction in any medium or format, as long as you give appropriate credit to the original author(s) and the source, provide a link to the Creative Commons license, and indicate if changes were made. The images or other third party material in this article are included in the article’s Creative Commons license, unless indicated otherwise in a credit line to the material. If material is not included in the article’s Creative Commons license and your intended use is not permitted by statutory regulation or exceeds the permitted use, you will need to obtain permission directly from the copyright holder. To view a copy of this license, visit http://creativecommons.org/licenses/by/4.0/. |
spellingShingle | Article Sinterhauf, Anna Traeger, Georg A. Momeni Pakdehi, Davood Schädlich, Philip Willke, Philip Speck, Florian Seyller, Thomas Tegenkamp, Christoph Pierz, Klaus Schumacher, Hans Werner Wenderoth, Martin Substrate induced nanoscale resistance variation in epitaxial graphene |
title | Substrate induced nanoscale resistance variation in epitaxial graphene |
title_full | Substrate induced nanoscale resistance variation in epitaxial graphene |
title_fullStr | Substrate induced nanoscale resistance variation in epitaxial graphene |
title_full_unstemmed | Substrate induced nanoscale resistance variation in epitaxial graphene |
title_short | Substrate induced nanoscale resistance variation in epitaxial graphene |
title_sort | substrate induced nanoscale resistance variation in epitaxial graphene |
topic | Article |
url | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC6987157/ https://www.ncbi.nlm.nih.gov/pubmed/31992696 http://dx.doi.org/10.1038/s41467-019-14192-0 |
work_keys_str_mv | AT sinterhaufanna substrateinducednanoscaleresistancevariationinepitaxialgraphene AT traegergeorga substrateinducednanoscaleresistancevariationinepitaxialgraphene AT momenipakdehidavood substrateinducednanoscaleresistancevariationinepitaxialgraphene AT schadlichphilip substrateinducednanoscaleresistancevariationinepitaxialgraphene AT willkephilip substrateinducednanoscaleresistancevariationinepitaxialgraphene AT speckflorian substrateinducednanoscaleresistancevariationinepitaxialgraphene AT seyllerthomas substrateinducednanoscaleresistancevariationinepitaxialgraphene AT tegenkampchristoph substrateinducednanoscaleresistancevariationinepitaxialgraphene AT pierzklaus substrateinducednanoscaleresistancevariationinepitaxialgraphene AT schumacherhanswerner substrateinducednanoscaleresistancevariationinepitaxialgraphene AT wenderothmartin substrateinducednanoscaleresistancevariationinepitaxialgraphene |