Lithography-Free Route to Hierarchical Structuring of High-χ Block Copolymers on a Gradient Patterned Surface

A chemically defined patterned surface was created via a combined process of controlled evaporative self-assembly of concentric polymer stripes and the selective surface modification of polymer brush. The former process involved physical adsorption of poly (methyl methacrylate) (PMMA) segments into...

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Detalles Bibliográficos
Autores principales: Cho, Ha Ryeong, Choe, Ayoung, Park, Woon Ik, Ko, Hyunhyub, Byun, Myunghwan
Formato: Online Artículo Texto
Lenguaje:English
Publicado: MDPI 2020
Materias:
Article
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC7013446/
https://www.ncbi.nlm.nih.gov/pubmed/31936578
http://dx.doi.org/10.3390/ma13020304

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC7013446/
https://www.ncbi.nlm.nih.gov/pubmed/31936578
http://dx.doi.org/10.3390/ma13020304

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