Role of a 193 nm ArF Excimer Laser in Laser-Assisted Plasma-Enhanced Chemical Vapor Deposition of SiN(x) for Low Temperature Thin Film Encapsulation

In this study, silicon nitride thin films are deposited on organic polyethylene-naphthalate (PEN) substrates by laser assisted plasma enhanced chemical vapor deposition (LAPECVD) at a low temperature (150 °C) for the purpose of evaluating the encapsulation performance. A plasma generator is placed a...

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Detalles Bibliográficos
Autores principales: An, Kunsik, Lee, Ho-Nyun, Cho, Kwan Hyun, Lee, Seung-Woo, Hwang, David J., Kang, Kyung-Tae
Formato: Online Artículo Texto
Lenguaje:English
Publicado: MDPI 2020
Materias:
Article
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC7019693/
https://www.ncbi.nlm.nih.gov/pubmed/31941056
http://dx.doi.org/10.3390/mi11010088

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC7019693/
https://www.ncbi.nlm.nih.gov/pubmed/31941056
http://dx.doi.org/10.3390/mi11010088

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