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Author Correction: Physical and chemical descriptors for predicting interfacial thermal resistance

Detalles Bibliográficos
Autores principales:	Wu, Yen-Ju, Zhan, Tianzhuo, Hou, Zhufeng, Fang, Lei, Xu, Yibin
Formato:	Online Artículo Texto
Lenguaje:	English
Publicado:	Nature Publishing Group UK 2020
Materias:	Author Correction
Acceso en línea:	https://www.ncbi.nlm.nih.gov/pmc/articles/PMC7026154/ https://www.ncbi.nlm.nih.gov/pubmed/32066729 http://dx.doi.org/10.1038/s41597-020-0405-y

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