Cargando…
O-FIB: far-field-induced near-field breakdown for direct nanowriting in an atmospheric environment
Nanoscale surface texturing, drilling, cutting, and spatial sculpturing, which are essential for applications, including thin-film solar cells, photonic chips, antireflection, wettability, and friction drag reduction, require not only high accuracy in material processing, but also the capability of...
Autores principales: | , , , , , , |
---|---|
Formato: | Online Artículo Texto |
Lenguaje: | English |
Publicado: |
Nature Publishing Group UK
2020
|
Materias: | |
Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC7073331/ https://www.ncbi.nlm.nih.gov/pubmed/32194955 http://dx.doi.org/10.1038/s41377-020-0275-2 |
_version_ | 1783506600056586240 |
---|---|
author | Li, Zhen-Ze Wang, Lei Fan, Hua Yu, Yan-Hao Sun, Hong-Bo Juodkazis, Saulius Chen, Qi-Dai |
author_facet | Li, Zhen-Ze Wang, Lei Fan, Hua Yu, Yan-Hao Sun, Hong-Bo Juodkazis, Saulius Chen, Qi-Dai |
author_sort | Li, Zhen-Ze |
collection | PubMed |
description | Nanoscale surface texturing, drilling, cutting, and spatial sculpturing, which are essential for applications, including thin-film solar cells, photonic chips, antireflection, wettability, and friction drag reduction, require not only high accuracy in material processing, but also the capability of manufacturing in an atmospheric environment. Widely used focused ion beam (FIB) technology offers nanoscale precision, but is limited by the vacuum-working conditions; therefore, it is not applicable to industrial-scale samples such as ship hulls or biomaterials, e.g., cells and tissues. Here, we report an optical far-field-induced near-field breakdown (O-FIB) approach as an optical version of the conventional FIB technique, which allows direct nanowriting in air. The writing is initiated from nanoholes created by femtosecond-laser-induced multiphoton absorption, and its cutting “knife edge” is sharpened by the far-field-regulated enhancement of the optical near field. A spatial resolution of less than 20 nm (λ/40, with λ being the light wavelength) is readily achieved. O-FIB is empowered by the utilization of simple polarization control of the incident light to steer the nanogroove writing along the designed pattern. The universality of near-field enhancement and localization makes O-FIB applicable to various materials, and enables a large-area printing mode that is superior to conventional FIB processing. |
format | Online Article Text |
id | pubmed-7073331 |
institution | National Center for Biotechnology Information |
language | English |
publishDate | 2020 |
publisher | Nature Publishing Group UK |
record_format | MEDLINE/PubMed |
spelling | pubmed-70733312020-03-19 O-FIB: far-field-induced near-field breakdown for direct nanowriting in an atmospheric environment Li, Zhen-Ze Wang, Lei Fan, Hua Yu, Yan-Hao Sun, Hong-Bo Juodkazis, Saulius Chen, Qi-Dai Light Sci Appl Article Nanoscale surface texturing, drilling, cutting, and spatial sculpturing, which are essential for applications, including thin-film solar cells, photonic chips, antireflection, wettability, and friction drag reduction, require not only high accuracy in material processing, but also the capability of manufacturing in an atmospheric environment. Widely used focused ion beam (FIB) technology offers nanoscale precision, but is limited by the vacuum-working conditions; therefore, it is not applicable to industrial-scale samples such as ship hulls or biomaterials, e.g., cells and tissues. Here, we report an optical far-field-induced near-field breakdown (O-FIB) approach as an optical version of the conventional FIB technique, which allows direct nanowriting in air. The writing is initiated from nanoholes created by femtosecond-laser-induced multiphoton absorption, and its cutting “knife edge” is sharpened by the far-field-regulated enhancement of the optical near field. A spatial resolution of less than 20 nm (λ/40, with λ being the light wavelength) is readily achieved. O-FIB is empowered by the utilization of simple polarization control of the incident light to steer the nanogroove writing along the designed pattern. The universality of near-field enhancement and localization makes O-FIB applicable to various materials, and enables a large-area printing mode that is superior to conventional FIB processing. Nature Publishing Group UK 2020-03-16 /pmc/articles/PMC7073331/ /pubmed/32194955 http://dx.doi.org/10.1038/s41377-020-0275-2 Text en © The Author(s) 2020 Open Access This article is licensed under a Creative Commons Attribution 4.0 International License, which permits use, sharing, adaptation, distribution and reproduction in any medium or format, as long as you give appropriate credit to the original author(s) and the source, provide a link to the Creative Commons license, and indicate if changes were made. The images or other third party material in this article are included in the article’s Creative Commons license, unless indicated otherwise in a credit line to the material. If material is not included in the article’s Creative Commons license and your intended use is not permitted by statutory regulation or exceeds the permitted use, you will need to obtain permission directly from the copyright holder. To view a copy of this license, visit http://creativecommons.org/licenses/by/4.0/. |
spellingShingle | Article Li, Zhen-Ze Wang, Lei Fan, Hua Yu, Yan-Hao Sun, Hong-Bo Juodkazis, Saulius Chen, Qi-Dai O-FIB: far-field-induced near-field breakdown for direct nanowriting in an atmospheric environment |
title | O-FIB: far-field-induced near-field breakdown for direct nanowriting in an atmospheric environment |
title_full | O-FIB: far-field-induced near-field breakdown for direct nanowriting in an atmospheric environment |
title_fullStr | O-FIB: far-field-induced near-field breakdown for direct nanowriting in an atmospheric environment |
title_full_unstemmed | O-FIB: far-field-induced near-field breakdown for direct nanowriting in an atmospheric environment |
title_short | O-FIB: far-field-induced near-field breakdown for direct nanowriting in an atmospheric environment |
title_sort | o-fib: far-field-induced near-field breakdown for direct nanowriting in an atmospheric environment |
topic | Article |
url | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC7073331/ https://www.ncbi.nlm.nih.gov/pubmed/32194955 http://dx.doi.org/10.1038/s41377-020-0275-2 |
work_keys_str_mv | AT lizhenze ofibfarfieldinducednearfieldbreakdownfordirectnanowritinginanatmosphericenvironment AT wanglei ofibfarfieldinducednearfieldbreakdownfordirectnanowritinginanatmosphericenvironment AT fanhua ofibfarfieldinducednearfieldbreakdownfordirectnanowritinginanatmosphericenvironment AT yuyanhao ofibfarfieldinducednearfieldbreakdownfordirectnanowritinginanatmosphericenvironment AT sunhongbo ofibfarfieldinducednearfieldbreakdownfordirectnanowritinginanatmosphericenvironment AT juodkazissaulius ofibfarfieldinducednearfieldbreakdownfordirectnanowritinginanatmosphericenvironment AT chenqidai ofibfarfieldinducednearfieldbreakdownfordirectnanowritinginanatmosphericenvironment |