Antireflective Transparent Conductive Oxide Film Based on a Tapered Porous Nanostructure

A new architecture for antireflection (AR) has been developed to break the trade-off between the optical transmittance and the electrical conduction impeding the performance of transparent conductive oxide (TCO) films. The tapered porous nanostructure with a complex continuous refractive index effec...

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Detalles Bibliográficos
Autores principales: Choi, Kiwoon, Jung, Jaehoon, Kim, Jongyoung, Lee, Joonho, Lee, Han Sup, Kang, Il-Suk
Formato: Online Artículo Texto
Lenguaje:English
Publicado: MDPI 2020
Materias:
Communication
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC7074669/
https://www.ncbi.nlm.nih.gov/pubmed/32079165
http://dx.doi.org/10.3390/mi11020206
Descripción
Sumario:A new architecture for antireflection (AR) has been developed to break the trade-off between the optical transmittance and the electrical conduction impeding the performance of transparent conductive oxide (TCO) films. The tapered porous nanostructure with a complex continuous refractive index effectively eliminates reflections from the interfaces between air and the TCO and TCO and the substrate. Compared to the conventional TCO film, the AR TCO film exhibited the same electrical conduction, with an average transmittance of 88.7% in the 400–800 nm range, a 10.3% increase. The new AR TCO film is expected to improve the performance of various optoelectronic devices.

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