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Addendum: Zhang, C., et al. Pulsed Laser-Assisted Helium Ion Nanomachining of Monolayer Graphene—Direct-Write Kirigami Patterns. Nanomaterials 2019, 9, 1394
| Autores principales: | , , , , , , , |
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| Formato: | Online Artículo Texto |
| Lenguaje: | English |
| Publicado: |
MDPI
2020
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| Materias: | |
| Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC7075130/ http://dx.doi.org/10.3390/nano10020273 |
| _version_ | 1783506975649169408 |
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| author | Zhang, Cheng Dyck, Ondrej Garfinkel, David A. Stanford, Michael G. Belianinov, Alex A. Fowlkes, Jason D. Jesse, Stephen Rack, Philip D. |
| author_facet | Zhang, Cheng Dyck, Ondrej Garfinkel, David A. Stanford, Michael G. Belianinov, Alex A. Fowlkes, Jason D. Jesse, Stephen Rack, Philip D. |
| author_sort | Zhang, Cheng |
| collection | PubMed |
| description | |
| format | Online Article Text |
| id | pubmed-7075130 |
| institution | National Center for Biotechnology Information |
| language | English |
| publishDate | 2020 |
| publisher | MDPI |
| record_format | MEDLINE/PubMed |
| spelling | pubmed-70751302020-03-20 Addendum: Zhang, C., et al. Pulsed Laser-Assisted Helium Ion Nanomachining of Monolayer Graphene—Direct-Write Kirigami Patterns. Nanomaterials 2019, 9, 1394 Zhang, Cheng Dyck, Ondrej Garfinkel, David A. Stanford, Michael G. Belianinov, Alex A. Fowlkes, Jason D. Jesse, Stephen Rack, Philip D. Nanomaterials (Basel) Addendum MDPI 2020-02-06 /pmc/articles/PMC7075130/ http://dx.doi.org/10.3390/nano10020273 Text en © 2020 by the authors. Licensee MDPI, Basel, Switzerland. This article is an open access article distributed under the terms and conditions of the Creative Commons Attribution (CC BY) license (http://creativecommons.org/licenses/by/4.0/). |
| spellingShingle | Addendum Zhang, Cheng Dyck, Ondrej Garfinkel, David A. Stanford, Michael G. Belianinov, Alex A. Fowlkes, Jason D. Jesse, Stephen Rack, Philip D. Addendum: Zhang, C., et al. Pulsed Laser-Assisted Helium Ion Nanomachining of Monolayer Graphene—Direct-Write Kirigami Patterns. Nanomaterials 2019, 9, 1394 |
| title | Addendum: Zhang, C., et al. Pulsed Laser-Assisted Helium Ion Nanomachining of Monolayer Graphene—Direct-Write Kirigami Patterns. Nanomaterials 2019, 9, 1394 |
| title_full | Addendum: Zhang, C., et al. Pulsed Laser-Assisted Helium Ion Nanomachining of Monolayer Graphene—Direct-Write Kirigami Patterns. Nanomaterials 2019, 9, 1394 |
| title_fullStr | Addendum: Zhang, C., et al. Pulsed Laser-Assisted Helium Ion Nanomachining of Monolayer Graphene—Direct-Write Kirigami Patterns. Nanomaterials 2019, 9, 1394 |
| title_full_unstemmed | Addendum: Zhang, C., et al. Pulsed Laser-Assisted Helium Ion Nanomachining of Monolayer Graphene—Direct-Write Kirigami Patterns. Nanomaterials 2019, 9, 1394 |
| title_short | Addendum: Zhang, C., et al. Pulsed Laser-Assisted Helium Ion Nanomachining of Monolayer Graphene—Direct-Write Kirigami Patterns. Nanomaterials 2019, 9, 1394 |
| title_sort | addendum: zhang, c., et al. pulsed laser-assisted helium ion nanomachining of monolayer graphene—direct-write kirigami patterns. nanomaterials 2019, 9, 1394 |
| topic | Addendum |
| url | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC7075130/ http://dx.doi.org/10.3390/nano10020273 |
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