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Quantum valley Hall effect in wide-gap semiconductor SiC monolayer

We have investigated the valley Chern number and gapless edge states in wide-gap semiconductor SiC and BN monolayers by using the density functional theory calculations. We found that while SiC monolayer has a non-quantized valley Chern number due to a partial mixing of the Berry curvature peaks per...

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Autores principales: Lee, Kyu Won, Lee, Cheol Eui
Formato: Online Artículo Texto
Lenguaje:English
Publicado: Nature Publishing Group UK 2020
Materias:
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC7081196/
https://www.ncbi.nlm.nih.gov/pubmed/32193440
http://dx.doi.org/10.1038/s41598-020-61906-2
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author Lee, Kyu Won
Lee, Cheol Eui
author_facet Lee, Kyu Won
Lee, Cheol Eui
author_sort Lee, Kyu Won
collection PubMed
description We have investigated the valley Chern number and gapless edge states in wide-gap semiconductor SiC and BN monolayers by using the density functional theory calculations. We found that while SiC monolayer has a non-quantized valley Chern number due to a partial mixing of the Berry curvature peaks pertaining to the opposite valleys, there exist topologically protected gapless edge states within the bulk gap, leading to a quantum valley Hall effect. Doping of the opposite charge carriers causes a backscattering-free valley current flowing on the opposite edge, which can be used for experimental confirmation and application at room temperature. BN monolayer, on the other hand, was found to have gapped edge states due to the too large staggered AB-sublattice potentials.
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spelling pubmed-70811962020-03-23 Quantum valley Hall effect in wide-gap semiconductor SiC monolayer Lee, Kyu Won Lee, Cheol Eui Sci Rep Article We have investigated the valley Chern number and gapless edge states in wide-gap semiconductor SiC and BN monolayers by using the density functional theory calculations. We found that while SiC monolayer has a non-quantized valley Chern number due to a partial mixing of the Berry curvature peaks pertaining to the opposite valleys, there exist topologically protected gapless edge states within the bulk gap, leading to a quantum valley Hall effect. Doping of the opposite charge carriers causes a backscattering-free valley current flowing on the opposite edge, which can be used for experimental confirmation and application at room temperature. BN monolayer, on the other hand, was found to have gapped edge states due to the too large staggered AB-sublattice potentials. Nature Publishing Group UK 2020-03-19 /pmc/articles/PMC7081196/ /pubmed/32193440 http://dx.doi.org/10.1038/s41598-020-61906-2 Text en © The Author(s) 2020 Open Access This article is licensed under a Creative Commons Attribution 4.0 International License, which permits use, sharing, adaptation, distribution and reproduction in any medium or format, as long as you give appropriate credit to the original author(s) and the source, provide a link to the Creative Commons license, and indicate if changes were made. The images or other third party material in this article are included in the article’s Creative Commons license, unless indicated otherwise in a credit line to the material. If material is not included in the article’s Creative Commons license and your intended use is not permitted by statutory regulation or exceeds the permitted use, you will need to obtain permission directly from the copyright holder. To view a copy of this license, visit http://creativecommons.org/licenses/by/4.0/.
spellingShingle Article
Lee, Kyu Won
Lee, Cheol Eui
Quantum valley Hall effect in wide-gap semiconductor SiC monolayer
title Quantum valley Hall effect in wide-gap semiconductor SiC monolayer
title_full Quantum valley Hall effect in wide-gap semiconductor SiC monolayer
title_fullStr Quantum valley Hall effect in wide-gap semiconductor SiC monolayer
title_full_unstemmed Quantum valley Hall effect in wide-gap semiconductor SiC monolayer
title_short Quantum valley Hall effect in wide-gap semiconductor SiC monolayer
title_sort quantum valley hall effect in wide-gap semiconductor sic monolayer
topic Article
url https://www.ncbi.nlm.nih.gov/pmc/articles/PMC7081196/
https://www.ncbi.nlm.nih.gov/pubmed/32193440
http://dx.doi.org/10.1038/s41598-020-61906-2
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