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Flexibility of Fluorinated Graphene-Based Materials

The resistivity of different films and structures containing fluorinated graphene (FG) flakes and chemical vapor deposition (CVD)-grown graphene of various fluorination degrees under tensile and compressive strains due to bending deformations was studied. Graphene and multilayer graphene films grown...

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Detalles Bibliográficos
Autores principales: Antonova, Irina, Nebogatikova, Nadezhda, Zerrouki, Nabila, Kurkina, Irina, Ivanov, Artem
Formato: Online Artículo Texto
Lenguaje:English
Publicado: MDPI 2020
Materias:
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC7084608/
https://www.ncbi.nlm.nih.gov/pubmed/32106413
http://dx.doi.org/10.3390/ma13051032
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author Antonova, Irina
Nebogatikova, Nadezhda
Zerrouki, Nabila
Kurkina, Irina
Ivanov, Artem
author_facet Antonova, Irina
Nebogatikova, Nadezhda
Zerrouki, Nabila
Kurkina, Irina
Ivanov, Artem
author_sort Antonova, Irina
collection PubMed
description The resistivity of different films and structures containing fluorinated graphene (FG) flakes and chemical vapor deposition (CVD)-grown graphene of various fluorination degrees under tensile and compressive strains due to bending deformations was studied. Graphene and multilayer graphene films grown by means of the chemical vapor deposition (CVD) method were transferred onto the flexible substrate by laminating and were subjected to fluorination. They demonstrated a weak fluorination degree (F/C lower 20%). Compressive strains led to a strong (one-two orders of magnitude) decrease in the resistivity in both cases, which was most likely connected with the formation of additional conductive paths through fluorinated graphene. Tensile strain up to 3% caused by the bending of both types of CVD-grown FG led to a constant value of the resistivity or to an irreversible increase in the resistivity under repeated strain cycles. FG films created from the suspension of the fluorinated graphene with a fluorination degree of 20–25%, after the exclusion of design details of the used structures, demonstrated a stable resistivity at least up to 2–3% of tensile and compressive strain. The scale of resistance changes ΔR/R0 was found to be in the range of 14–28% with a different sign at the 10% tensile strain (bending radius 1 mm). In the case of the structures with the FG thin film printed on polyvinyl alcohol, a stable bipolar resistive switching was observed up to 6.5% of the tensile strain (bending radius was 2 mm). A further increase in strain (6.5–8%) leads to a decrease in ON/OFF current ratio from 5 down to 2 orders of magnitude. The current ratio decrease is connected with an increase under the tensile strain in distances between conductive agents (graphene islands and traps at the interface with polyvinyl alcohol) and thickness of fluorinated barriers within the active layer. The excellent performance of the crossbar memristor structures under tensile strain shows that the FG films and structures created from suspension are especially promising for flexible electronics.
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spelling pubmed-70846082020-03-24 Flexibility of Fluorinated Graphene-Based Materials Antonova, Irina Nebogatikova, Nadezhda Zerrouki, Nabila Kurkina, Irina Ivanov, Artem Materials (Basel) Article The resistivity of different films and structures containing fluorinated graphene (FG) flakes and chemical vapor deposition (CVD)-grown graphene of various fluorination degrees under tensile and compressive strains due to bending deformations was studied. Graphene and multilayer graphene films grown by means of the chemical vapor deposition (CVD) method were transferred onto the flexible substrate by laminating and were subjected to fluorination. They demonstrated a weak fluorination degree (F/C lower 20%). Compressive strains led to a strong (one-two orders of magnitude) decrease in the resistivity in both cases, which was most likely connected with the formation of additional conductive paths through fluorinated graphene. Tensile strain up to 3% caused by the bending of both types of CVD-grown FG led to a constant value of the resistivity or to an irreversible increase in the resistivity under repeated strain cycles. FG films created from the suspension of the fluorinated graphene with a fluorination degree of 20–25%, after the exclusion of design details of the used structures, demonstrated a stable resistivity at least up to 2–3% of tensile and compressive strain. The scale of resistance changes ΔR/R0 was found to be in the range of 14–28% with a different sign at the 10% tensile strain (bending radius 1 mm). In the case of the structures with the FG thin film printed on polyvinyl alcohol, a stable bipolar resistive switching was observed up to 6.5% of the tensile strain (bending radius was 2 mm). A further increase in strain (6.5–8%) leads to a decrease in ON/OFF current ratio from 5 down to 2 orders of magnitude. The current ratio decrease is connected with an increase under the tensile strain in distances between conductive agents (graphene islands and traps at the interface with polyvinyl alcohol) and thickness of fluorinated barriers within the active layer. The excellent performance of the crossbar memristor structures under tensile strain shows that the FG films and structures created from suspension are especially promising for flexible electronics. MDPI 2020-02-25 /pmc/articles/PMC7084608/ /pubmed/32106413 http://dx.doi.org/10.3390/ma13051032 Text en © 2020 by the authors. Licensee MDPI, Basel, Switzerland. This article is an open access article distributed under the terms and conditions of the Creative Commons Attribution (CC BY) license (http://creativecommons.org/licenses/by/4.0/).
spellingShingle Article
Antonova, Irina
Nebogatikova, Nadezhda
Zerrouki, Nabila
Kurkina, Irina
Ivanov, Artem
Flexibility of Fluorinated Graphene-Based Materials
title Flexibility of Fluorinated Graphene-Based Materials
title_full Flexibility of Fluorinated Graphene-Based Materials
title_fullStr Flexibility of Fluorinated Graphene-Based Materials
title_full_unstemmed Flexibility of Fluorinated Graphene-Based Materials
title_short Flexibility of Fluorinated Graphene-Based Materials
title_sort flexibility of fluorinated graphene-based materials
topic Article
url https://www.ncbi.nlm.nih.gov/pmc/articles/PMC7084608/
https://www.ncbi.nlm.nih.gov/pubmed/32106413
http://dx.doi.org/10.3390/ma13051032
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