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Plasma Fabrication and SERS Functionality of Gold Crowned Silicon Submicrometer Pillars

Sequential plasma processes combined with specific lithographic methods allow for the fabrication of advanced material structures. In the present work, we used self-assembled colloidal monolayers as lithographic structures for the conformation of ordered Si submicrometer pillars by reactive ion etch...

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Detalles Bibliográficos
Autores principales: Pellacani, Paola, Morasso, Carlo, Picciolini, Silvia, Gallach, Dario, Fornasari, Lucia, Marabelli, Franco, Manso Silvan, Miguel
Formato: Online Artículo Texto
Lenguaje:English
Publicado: MDPI 2020
Materias:
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC7085028/
https://www.ncbi.nlm.nih.gov/pubmed/32164146
http://dx.doi.org/10.3390/ma13051244

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