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Polishing of Silicon Nitride Ceramic Balls by Clustered Magnetorheological Finish

In this study, a novel finishing method, entitled clustered magnetorheological finish (CMRF), was proposed to improve surface finish of the silicon nitride ([Formula: see text]) balls with ultra fine precision. The effects of different polishing parameters including rotation speeds, eccentricities a...

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Autores principales: Xiao, Xiao-lan, Li, Guang-xian, Mei, Hai-juan, Yan, Qiu-sheng, Lin, Hua-tay, Zhang, Feng-lin
Formato: Online Artículo Texto
Lenguaje:English
Publicado: MDPI 2020
Materias:
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC7143117/
https://www.ncbi.nlm.nih.gov/pubmed/32183344
http://dx.doi.org/10.3390/mi11030304
_version_ 1783519539632275456
author Xiao, Xiao-lan
Li, Guang-xian
Mei, Hai-juan
Yan, Qiu-sheng
Lin, Hua-tay
Zhang, Feng-lin
author_facet Xiao, Xiao-lan
Li, Guang-xian
Mei, Hai-juan
Yan, Qiu-sheng
Lin, Hua-tay
Zhang, Feng-lin
author_sort Xiao, Xiao-lan
collection PubMed
description In this study, a novel finishing method, entitled clustered magnetorheological finish (CMRF), was proposed to improve surface finish of the silicon nitride ([Formula: see text]) balls with ultra fine precision. The effects of different polishing parameters including rotation speeds, eccentricities and the machining gaps on surface finish of [Formula: see text] balls were investigated by analyzing the roughness, sphericity and the micro morphology of the machined surface. The experimental results showed that the polishing parameters significantly influenced the surface finish. The best surface finish was obtained by using the polishing parameters: the machining gap of 0.8 mm, the eccentricity of 10 mm and the rotation ratio of 3/4. To further investigate the influence of the polishing parameters on the surface finish, an analytical model was also developed to analyze the kinematics of the ceramic ball during CMRF process. The resulting surface finish, as a function of different polishing parameters employed, was evaluated by analyzing the visualized finishing trace and the distribution of the contact points. The simulative results showed that the distribution and trace of the contact points changed with different polishing parameters, which was in accordance with the results of experiments.
format Online
Article
Text
id pubmed-7143117
institution National Center for Biotechnology Information
language English
publishDate 2020
publisher MDPI
record_format MEDLINE/PubMed
spelling pubmed-71431172020-04-14 Polishing of Silicon Nitride Ceramic Balls by Clustered Magnetorheological Finish Xiao, Xiao-lan Li, Guang-xian Mei, Hai-juan Yan, Qiu-sheng Lin, Hua-tay Zhang, Feng-lin Micromachines (Basel) Article In this study, a novel finishing method, entitled clustered magnetorheological finish (CMRF), was proposed to improve surface finish of the silicon nitride ([Formula: see text]) balls with ultra fine precision. The effects of different polishing parameters including rotation speeds, eccentricities and the machining gaps on surface finish of [Formula: see text] balls were investigated by analyzing the roughness, sphericity and the micro morphology of the machined surface. The experimental results showed that the polishing parameters significantly influenced the surface finish. The best surface finish was obtained by using the polishing parameters: the machining gap of 0.8 mm, the eccentricity of 10 mm and the rotation ratio of 3/4. To further investigate the influence of the polishing parameters on the surface finish, an analytical model was also developed to analyze the kinematics of the ceramic ball during CMRF process. The resulting surface finish, as a function of different polishing parameters employed, was evaluated by analyzing the visualized finishing trace and the distribution of the contact points. The simulative results showed that the distribution and trace of the contact points changed with different polishing parameters, which was in accordance with the results of experiments. MDPI 2020-03-14 /pmc/articles/PMC7143117/ /pubmed/32183344 http://dx.doi.org/10.3390/mi11030304 Text en © 2020 by the authors. Licensee MDPI, Basel, Switzerland. This article is an open access article distributed under the terms and conditions of the Creative Commons Attribution (CC BY) license (http://creativecommons.org/licenses/by/4.0/).
spellingShingle Article
Xiao, Xiao-lan
Li, Guang-xian
Mei, Hai-juan
Yan, Qiu-sheng
Lin, Hua-tay
Zhang, Feng-lin
Polishing of Silicon Nitride Ceramic Balls by Clustered Magnetorheological Finish
title Polishing of Silicon Nitride Ceramic Balls by Clustered Magnetorheological Finish
title_full Polishing of Silicon Nitride Ceramic Balls by Clustered Magnetorheological Finish
title_fullStr Polishing of Silicon Nitride Ceramic Balls by Clustered Magnetorheological Finish
title_full_unstemmed Polishing of Silicon Nitride Ceramic Balls by Clustered Magnetorheological Finish
title_short Polishing of Silicon Nitride Ceramic Balls by Clustered Magnetorheological Finish
title_sort polishing of silicon nitride ceramic balls by clustered magnetorheological finish
topic Article
url https://www.ncbi.nlm.nih.gov/pmc/articles/PMC7143117/
https://www.ncbi.nlm.nih.gov/pubmed/32183344
http://dx.doi.org/10.3390/mi11030304
work_keys_str_mv AT xiaoxiaolan polishingofsiliconnitrideceramicballsbyclusteredmagnetorheologicalfinish
AT liguangxian polishingofsiliconnitrideceramicballsbyclusteredmagnetorheologicalfinish
AT meihaijuan polishingofsiliconnitrideceramicballsbyclusteredmagnetorheologicalfinish
AT yanqiusheng polishingofsiliconnitrideceramicballsbyclusteredmagnetorheologicalfinish
AT linhuatay polishingofsiliconnitrideceramicballsbyclusteredmagnetorheologicalfinish
AT zhangfenglin polishingofsiliconnitrideceramicballsbyclusteredmagnetorheologicalfinish