Novel Method for Electroless Etching of 6H–SiC

In this article, we report an electroless method to fabricate porous hexagonal silicon carbide and hexagonal silicon carbide nanoparticles (NPs) as small as 1 nm using wet chemical stain etching. We observe quantum confinement effect for ultrasmall hexagonal SiC NPs in contrast to the cubic SiC NPs....

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Detalles Bibliográficos
Autores principales: Károlyházy, Gyula, Beke, Dávid, Zalka, Dóra, Lenk, Sándor, Krafcsik, Olga, Kamarás, Katalin, Gali, Ádám
Formato: Online Artículo Texto
Lenguaje:English
Publicado: MDPI 2020
Materias:
Article
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC7153389/
https://www.ncbi.nlm.nih.gov/pubmed/32192147
http://dx.doi.org/10.3390/nano10030538
Descripción
Sumario:In this article, we report an electroless method to fabricate porous hexagonal silicon carbide and hexagonal silicon carbide nanoparticles (NPs) as small as 1 nm using wet chemical stain etching. We observe quantum confinement effect for ultrasmall hexagonal SiC NPs in contrast to the cubic SiC NPs. We attribute this difference to the various surface terminations of the two polytypes of SiC NPs.

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