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Novel Method for Electroless Etching of 6H–SiC

In this article, we report an electroless method to fabricate porous hexagonal silicon carbide and hexagonal silicon carbide nanoparticles (NPs) as small as 1 nm using wet chemical stain etching. We observe quantum confinement effect for ultrasmall hexagonal SiC NPs in contrast to the cubic SiC NPs....

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Detalles Bibliográficos
Autores principales: Károlyházy, Gyula, Beke, Dávid, Zalka, Dóra, Lenk, Sándor, Krafcsik, Olga, Kamarás, Katalin, Gali, Ádám
Formato: Online Artículo Texto
Lenguaje:English
Publicado: MDPI 2020
Materias:
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC7153389/
https://www.ncbi.nlm.nih.gov/pubmed/32192147
http://dx.doi.org/10.3390/nano10030538
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author Károlyházy, Gyula
Beke, Dávid
Zalka, Dóra
Lenk, Sándor
Krafcsik, Olga
Kamarás, Katalin
Gali, Ádám
author_facet Károlyházy, Gyula
Beke, Dávid
Zalka, Dóra
Lenk, Sándor
Krafcsik, Olga
Kamarás, Katalin
Gali, Ádám
author_sort Károlyházy, Gyula
collection PubMed
description In this article, we report an electroless method to fabricate porous hexagonal silicon carbide and hexagonal silicon carbide nanoparticles (NPs) as small as 1 nm using wet chemical stain etching. We observe quantum confinement effect for ultrasmall hexagonal SiC NPs in contrast to the cubic SiC NPs. We attribute this difference to the various surface terminations of the two polytypes of SiC NPs.
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spelling pubmed-71533892020-04-20 Novel Method for Electroless Etching of 6H–SiC Károlyházy, Gyula Beke, Dávid Zalka, Dóra Lenk, Sándor Krafcsik, Olga Kamarás, Katalin Gali, Ádám Nanomaterials (Basel) Article In this article, we report an electroless method to fabricate porous hexagonal silicon carbide and hexagonal silicon carbide nanoparticles (NPs) as small as 1 nm using wet chemical stain etching. We observe quantum confinement effect for ultrasmall hexagonal SiC NPs in contrast to the cubic SiC NPs. We attribute this difference to the various surface terminations of the two polytypes of SiC NPs. MDPI 2020-03-17 /pmc/articles/PMC7153389/ /pubmed/32192147 http://dx.doi.org/10.3390/nano10030538 Text en © 2020 by the authors. Licensee MDPI, Basel, Switzerland. This article is an open access article distributed under the terms and conditions of the Creative Commons Attribution (CC BY) license (http://creativecommons.org/licenses/by/4.0/).
spellingShingle Article
Károlyházy, Gyula
Beke, Dávid
Zalka, Dóra
Lenk, Sándor
Krafcsik, Olga
Kamarás, Katalin
Gali, Ádám
Novel Method for Electroless Etching of 6H–SiC
title Novel Method for Electroless Etching of 6H–SiC
title_full Novel Method for Electroless Etching of 6H–SiC
title_fullStr Novel Method for Electroless Etching of 6H–SiC
title_full_unstemmed Novel Method for Electroless Etching of 6H–SiC
title_short Novel Method for Electroless Etching of 6H–SiC
title_sort novel method for electroless etching of 6h–sic
topic Article
url https://www.ncbi.nlm.nih.gov/pmc/articles/PMC7153389/
https://www.ncbi.nlm.nih.gov/pubmed/32192147
http://dx.doi.org/10.3390/nano10030538
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