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Novel Method for Electroless Etching of 6H–SiC
In this article, we report an electroless method to fabricate porous hexagonal silicon carbide and hexagonal silicon carbide nanoparticles (NPs) as small as 1 nm using wet chemical stain etching. We observe quantum confinement effect for ultrasmall hexagonal SiC NPs in contrast to the cubic SiC NPs....
Autores principales: | , , , , , , |
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Formato: | Online Artículo Texto |
Lenguaje: | English |
Publicado: |
MDPI
2020
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Materias: | |
Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC7153389/ https://www.ncbi.nlm.nih.gov/pubmed/32192147 http://dx.doi.org/10.3390/nano10030538 |
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author | Károlyházy, Gyula Beke, Dávid Zalka, Dóra Lenk, Sándor Krafcsik, Olga Kamarás, Katalin Gali, Ádám |
author_facet | Károlyházy, Gyula Beke, Dávid Zalka, Dóra Lenk, Sándor Krafcsik, Olga Kamarás, Katalin Gali, Ádám |
author_sort | Károlyházy, Gyula |
collection | PubMed |
description | In this article, we report an electroless method to fabricate porous hexagonal silicon carbide and hexagonal silicon carbide nanoparticles (NPs) as small as 1 nm using wet chemical stain etching. We observe quantum confinement effect for ultrasmall hexagonal SiC NPs in contrast to the cubic SiC NPs. We attribute this difference to the various surface terminations of the two polytypes of SiC NPs. |
format | Online Article Text |
id | pubmed-7153389 |
institution | National Center for Biotechnology Information |
language | English |
publishDate | 2020 |
publisher | MDPI |
record_format | MEDLINE/PubMed |
spelling | pubmed-71533892020-04-20 Novel Method for Electroless Etching of 6H–SiC Károlyházy, Gyula Beke, Dávid Zalka, Dóra Lenk, Sándor Krafcsik, Olga Kamarás, Katalin Gali, Ádám Nanomaterials (Basel) Article In this article, we report an electroless method to fabricate porous hexagonal silicon carbide and hexagonal silicon carbide nanoparticles (NPs) as small as 1 nm using wet chemical stain etching. We observe quantum confinement effect for ultrasmall hexagonal SiC NPs in contrast to the cubic SiC NPs. We attribute this difference to the various surface terminations of the two polytypes of SiC NPs. MDPI 2020-03-17 /pmc/articles/PMC7153389/ /pubmed/32192147 http://dx.doi.org/10.3390/nano10030538 Text en © 2020 by the authors. Licensee MDPI, Basel, Switzerland. This article is an open access article distributed under the terms and conditions of the Creative Commons Attribution (CC BY) license (http://creativecommons.org/licenses/by/4.0/). |
spellingShingle | Article Károlyházy, Gyula Beke, Dávid Zalka, Dóra Lenk, Sándor Krafcsik, Olga Kamarás, Katalin Gali, Ádám Novel Method for Electroless Etching of 6H–SiC |
title | Novel Method for Electroless Etching of 6H–SiC |
title_full | Novel Method for Electroless Etching of 6H–SiC |
title_fullStr | Novel Method for Electroless Etching of 6H–SiC |
title_full_unstemmed | Novel Method for Electroless Etching of 6H–SiC |
title_short | Novel Method for Electroless Etching of 6H–SiC |
title_sort | novel method for electroless etching of 6h–sic |
topic | Article |
url | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC7153389/ https://www.ncbi.nlm.nih.gov/pubmed/32192147 http://dx.doi.org/10.3390/nano10030538 |
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