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Interfacial dielectric layer as an origin of polarization fatigue in ferroelectric capacitors

Origins of polarization fatigue in ferroelectric capacitors under electric field cycling still remain unclear. Here, we experimentally identify origins of polarization fatigue in ferroelectric PbZr(0.52)Ti(0.48)O(3) (PZT) thin-film capacitors by investigating their fatigue behaviours and interface s...

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Autores principales: Do, M. T., Gauquelin, N., Nguyen, M. D., Wang, J., Verbeeck, J., Blom, F., Koster, G., Houwman, E. P., Rijnders, G.
Formato: Online Artículo Texto
Lenguaje:English
Publicado: Nature Publishing Group UK 2020
Materias:
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC7192946/
https://www.ncbi.nlm.nih.gov/pubmed/32355206
http://dx.doi.org/10.1038/s41598-020-64451-0
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author Do, M. T.
Gauquelin, N.
Nguyen, M. D.
Wang, J.
Verbeeck, J.
Blom, F.
Koster, G.
Houwman, E. P.
Rijnders, G.
author_facet Do, M. T.
Gauquelin, N.
Nguyen, M. D.
Wang, J.
Verbeeck, J.
Blom, F.
Koster, G.
Houwman, E. P.
Rijnders, G.
author_sort Do, M. T.
collection PubMed
description Origins of polarization fatigue in ferroelectric capacitors under electric field cycling still remain unclear. Here, we experimentally identify origins of polarization fatigue in ferroelectric PbZr(0.52)Ti(0.48)O(3) (PZT) thin-film capacitors by investigating their fatigue behaviours and interface structures. The PZT layers are epitaxially grown on SrRuO(3)-buffered SrTiO(3) substrates by a pulsed laser deposition (PLD), and the capacitor top-electrodes are various, including SrRuO(3) (SRO) made by in-situ PLD, Pt by in-situ PLD (Pt-inPLD) and ex-situ sputtering (Pt-sputtered). We found that fatigue behaviour of the capacitor is directly related to the top-electrode/PZT interface structure. The Pt-sputtered/PZT/SRO capacitor has a thin defective layer at the top interface and shows early fatigue while the Pt-inPLD/PZT/SRO and SRO/PZT/SRO capacitor have clean top-interfaces and show much more fatigue resistance. The defective dielectric layer at the Pt-sputtered/PZT interface mainly contains carbon contaminants, which form during the capacitor ex-situ fabrication. Removal of this dielectric layer significantly delays the fatigue onset. Our results clearly indicate that dielectric layer at ferroelectric capacitor interfaces is the main origin of polarization fatigue, as previously proposed in the charge injection model.
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spelling pubmed-71929462020-05-05 Interfacial dielectric layer as an origin of polarization fatigue in ferroelectric capacitors Do, M. T. Gauquelin, N. Nguyen, M. D. Wang, J. Verbeeck, J. Blom, F. Koster, G. Houwman, E. P. Rijnders, G. Sci Rep Article Origins of polarization fatigue in ferroelectric capacitors under electric field cycling still remain unclear. Here, we experimentally identify origins of polarization fatigue in ferroelectric PbZr(0.52)Ti(0.48)O(3) (PZT) thin-film capacitors by investigating their fatigue behaviours and interface structures. The PZT layers are epitaxially grown on SrRuO(3)-buffered SrTiO(3) substrates by a pulsed laser deposition (PLD), and the capacitor top-electrodes are various, including SrRuO(3) (SRO) made by in-situ PLD, Pt by in-situ PLD (Pt-inPLD) and ex-situ sputtering (Pt-sputtered). We found that fatigue behaviour of the capacitor is directly related to the top-electrode/PZT interface structure. The Pt-sputtered/PZT/SRO capacitor has a thin defective layer at the top interface and shows early fatigue while the Pt-inPLD/PZT/SRO and SRO/PZT/SRO capacitor have clean top-interfaces and show much more fatigue resistance. The defective dielectric layer at the Pt-sputtered/PZT interface mainly contains carbon contaminants, which form during the capacitor ex-situ fabrication. Removal of this dielectric layer significantly delays the fatigue onset. Our results clearly indicate that dielectric layer at ferroelectric capacitor interfaces is the main origin of polarization fatigue, as previously proposed in the charge injection model. Nature Publishing Group UK 2020-04-30 /pmc/articles/PMC7192946/ /pubmed/32355206 http://dx.doi.org/10.1038/s41598-020-64451-0 Text en © The Author(s) 2020 Open Access This article is licensed under a Creative Commons Attribution 4.0 International License, which permits use, sharing, adaptation, distribution and reproduction in any medium or format, as long as you give appropriate credit to the original author(s) and the source, provide a link to the Creative Commons license, and indicate if changes were made. The images or other third party material in this article are included in the article’s Creative Commons license, unless indicated otherwise in a credit line to the material. If material is not included in the article’s Creative Commons license and your intended use is not permitted by statutory regulation or exceeds the permitted use, you will need to obtain permission directly from the copyright holder. To view a copy of this license, visit http://creativecommons.org/licenses/by/4.0/.
spellingShingle Article
Do, M. T.
Gauquelin, N.
Nguyen, M. D.
Wang, J.
Verbeeck, J.
Blom, F.
Koster, G.
Houwman, E. P.
Rijnders, G.
Interfacial dielectric layer as an origin of polarization fatigue in ferroelectric capacitors
title Interfacial dielectric layer as an origin of polarization fatigue in ferroelectric capacitors
title_full Interfacial dielectric layer as an origin of polarization fatigue in ferroelectric capacitors
title_fullStr Interfacial dielectric layer as an origin of polarization fatigue in ferroelectric capacitors
title_full_unstemmed Interfacial dielectric layer as an origin of polarization fatigue in ferroelectric capacitors
title_short Interfacial dielectric layer as an origin of polarization fatigue in ferroelectric capacitors
title_sort interfacial dielectric layer as an origin of polarization fatigue in ferroelectric capacitors
topic Article
url https://www.ncbi.nlm.nih.gov/pmc/articles/PMC7192946/
https://www.ncbi.nlm.nih.gov/pubmed/32355206
http://dx.doi.org/10.1038/s41598-020-64451-0
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